Study of copolymer properties for ArF excimer laser resists

Journal of Photopolymer Science and Technology

Volumn 10, Issue 4, 1997, Pages 559-560

  Asakawa, Koji ^a   Ushirogouchi, Tohru ^a   Shida, Naomi ^a   Okino, Takeshi ^a   Nakase, Makoto ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Acrylic polymer; Alicyclic; ArF; Menthyl; Molecular weight; Solubilty

Indexed keywords

EID: 0010225856     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.10.559     Document Type: Article

References (2)

1. N. Shida, T. Ushirogouchi, K. Asakawa, M. Nakase: J. Photopolym. Sci. Tecnol., 9,457(1996)
2. P. J. Flory: "Principle of Polymer Chemistry" (Conell Univ. Press, 1953)