A retrospective on 2-nitrobenzyl sulfonate photoacid generators

Journal of Imaging Science and Technology

Volumn 41, Issue 1, 1997, Pages 35-40

  Houlihan, F M ^a   Nalamasu, O ^a   Kometani, J M ^a   Reichmanis, E ^a  

^a LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTORESISTORS; PHOTORESISTS; THERMODYNAMIC STABILITY; ULTRAVIOLET DEVICES;

CHEMICALLY AMPLIFIED (CA) PHOTORESISTS; PHOTOACID GENERATORS (PAG);

PHOTOCHEMICAL REACTIONS;

EID: 0030679242     PISSN: 10623701     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (27)

1. (a) C. G. Willson, J. M. J. Frechet, T. Tessier, and F. M. Houlihan, J. Electrochem. Soc. 133(1): 181 (1986)
2. (b) H. Ito, Proceedings KTI Microelectronics Seminar, 81 (1988)
3. (c) E. Reichmanis, F. M. Houlihan, O. Nalamasu, and T. X. Neenan, Chem. Mat. 3: 397 (1991)
4. (d) A. A. Lamola, C. R. Szmanda, and J. W. Thackeray, Solid State Technol. 34(8): 53 (1991).
5. F. M. Houlihan, A. Shugard, R. Gooden, and E. Reichmanis, Macromol. 21: 2001 (1988).
6. G. L. Li-Bassi, J. Rad. Cur. 18 (1987).
7. G. L. Berner, Radcure Europe, Rist, Basel, Switzerland, p. 446 (1985).
8. Y. Yamaoka, T. Omote, H. Adachi, N. Kikuchi, Y. Watanabe, and T. Shirosaki, J. Photopolym. Sci. Technol. 3(3): 275 (1990).
9. M. Shirai, and M. Tsunooka, J. Photopolym. Sci. Technol. 3(3): 301 (1990).
10. L. Schlegel, T. Ueno, H. Shiraishi, N. Hayashi, and T. Iwayanagi, Chem. Mater. 2(3): 300 (1990).
11. K. F. Dossel, H. L. Huber, and H. Oertel, Microelec. Eng. 5: 97 (1986).
12. A. Menschig, A. Forchel, R. Dammel, J. Lingnau, U. Scheunemann, J. Theis, and S. Pongratz, Microelec. Eng. 9: 571 (1989).
13. T. X. Neenan, F. M. Houlihan, E. Reichmanis, J. M. Kometani, B. J. Bachman, and L. F. Thompson, Macromol. 23: 145 (1990).
14. (a) F. M. Houlihan, T. X. Neenan, E. Reichmanis, J. M. Kometani, and T. Chin, Chem. Mater. 3: 462 (1991)
15. (b) F. M. Houlihan, T. X. Neenan, and E. Reichmanis, US Patent 5,200,544 (1993)
16. (c) T. X. Neenan, F. M. Houlihan, E. Reichmanis, J. M. Kometani, and E. Chin, Photopolym. Sci. Techn. 4(3): 341 (1991).
17. (a) F. M. Houlihan, E. Chin, O. Nalamasu, J. M. Kometani, T. X. Neenan, A. Pangborn, J. Photopolym. Sci. Technol. 6(4): 515 (1993)
18. (b) F. M. Houlihan, E. Chin, O. Nalamasu, J. M. Kometani, T. X. Neenan, and A. Pangborn, J. Proc. SPIE, 2195: 137 (1994).
19. (a) F. M. Houlihan, E. Chin, O. Nalamasu, and J. M. Kometani, ACS Symposium series 537: 25, American Chemical Society, Washington, D.C. (1992)
20. (b) J. M. Kometani, F. M. Houlihan, S. A. Heffner, E. Chin, and O. Nalamasu, in Microelectronics Technology: Polymers for Advanced Imaging and Packaging, ACS Symposium Series 614: 207, American Chemical Society, Washington, D.C. (1995).
21. F. M. Houlihan, J. M. Kometani, E. Chin, R. Harley, and O. Nalamasu in Microelectronics Technology: Polymers for Advanced Imaging and Packaging, ACS Symposium Series 614: 84, American Chemical Society, Washington, D.C. (1995).
22. Organic Syntheses, Collective Volume I, H. Gillman, et. al., Eds., John Wiley & Sons, Inc, New York, 2nd ed., 1934, p. 336.
23. T. H. Lowry, and K. S. Schueller Richardson, in Mechanism and Theory in Organic Chemistry, Harper & Row, New York, 1976 p. 417
24. G. G. Barclay, D. R. Medeiros, and R. F. Sinta, Chem. Mater. 7: 1315 (1995).
25. O. Nalamasu, E. Reichmanis, M. Cheng, V. Pol, J. M. Kometani, F. M. Houlihan, T. X. Neenan, M. P. Bohrer, D. A. Mixon, and L. F. Thompson, Proceedings SPIE, 1466: (1991).
26. S. A. MacDonald, N. J. Clecak, and H. R. Wendt, Proceedings SPIE, 1466: 2 (1991).
27. H. Ito, W. P. England, and N. J. Clecak, Proceedings SPIE, 1925: 65 (1993).