Process-parameter-dependent optical and structural properties of ZrO2MgO mixed-composite films evaporated from the solid solution

Applied Optics

Volumn 37, Issue 4, 1998, Pages 698-718

  Sahoo, N K ^a   Shapiro, A P ^a  

^a NASA MARSHALL SPACE FLIGHT CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000308188     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.37.000698     Document Type: Article

References (65)

1. J. A. Dobrowoloski and R. A. Kemp, “Refinement of optical multilayer systems with different optimization procedure, ” Appl. Opt. 29, 2876-2893 (1990).
2. N. K. Sahoo and K. V. S. R. Apparao, “Modified complex method for constrained design and optimization of optical multilayer thin-film devices, ” Appl. Phys. A 59, 317-326, (1994).
3. 2 deposited by double electron-beam coevaporation, ” Appl. Opt. 35, 90-96 (1996).
4. H. Zhang and S. Liu, “Optical compound film deposited by double e-gun, ” Thin Solid Films 209, 148-149 (1992).
5. 2-ZnO films, ” Thin Solid Films 290-291, 80-83 (1996).
6. R. Bertram, M. F. Ouellette, and P. Y. Tse, “Inhomogeneous optical coatings: An experimental study of a new approach, ” Appl. Opt. 28, 2935-2939 (1989).
7. W. J. Gunning, R. L. Hall, F. J. Woodberry, W. H. Southwell, and N. S. Gluck, “Codeposition of continuous composition rugate filters, ” Appl. Opt. 28, 2945-2948 (1989).
8. R. Jacobsson, “Inhomogeneous and coevaporated homogeneous films for optical applications, ” Phys. Thin Films 8, 51-98 (1975).
9. R. Jacobsson, “Optical properties of a class of inhomogeneous thin films, ” Opt. Acta 10, 309-323 (1963).
10. A. Feldman, E. N. Farabaugh, W. K. Haller, D. M. Sanders, and R. A. Stempniak, “Modifying structure and properties of optical films by co-evaporation, ” J. Vac. Sci. Technol. A 4, 2969-2974 (1986).
11. 2 films deposited by reactive thermal coevaporation, ” J. Vac. Sci. Technol. A 10, 3207-3209 (1992).
12. 3, ” J. Vac. Sci. Technol. A 8, 3961-3966 (1990).
13. 3 in reactive magnetron sputtered thin films, ” J. Vac. Sci. Technol. A 5, 2085-2087 (1987).
14. Y. Tsou and F. C. Ho, “Optical properties of hafnia and coevaporated hafnia magnesium fluoride thin films, ” Appl. Opt. 35, 5091-5094 (1996).
15. 2 films, ” J. Vac. Sci Technol. A 9, 510-511 (1991).
16. F. Tcheliebou, A. Boyer, and L. Martin, “Studies on MgO-stabilized zirconia thin films in the UV-visible region, ” Thin Solid Films 249, 86-90 (1994).
17. D. M. Sanders, E. N. Farabaugh, and W. K. Haller, “Glassy optical coatings by multisource evaporation, ” in Thin Film Technologies and Special Applications, W. R. Hunter, ed., Proc. SPIE 346, 31-38 (1982).
18. E. N. Farabaugh and D. M. Sanders, “Microstructure of dielectric thin films formed by e-beam coevaporation, ” J. Vac. Sci. Technol. A 1, 356-359 (1983).
19. D. L. Porter and A. H. Heuer, “Microstructural development in MgO-stabilized zirconia (Mg-PSZ), ” J. Am. Ceram. Soc. 62, 298-305 (1979).
20. c solid solution in thin film form, ” Appl. Phys. A 63, 81-86 (1996).
21. 2 alloys, ” J. Mater. Sci 18, 457-470 (1983).
22. M. J. Readey, A. H. Heuer, and R. W. Steinbrech, “Annealing of test specimens of high-toughness magnesia-partially-stabilized zirconia, ” J. Am. Ceram. Soc. 71, c2-c6 (1988).
23. 2-MgO processed from liquid precursors, ” J. Am. Ceram. Soc. 75, 946-952 (1992).
24. 2-MgO system, ” J. Am. Ceram. Soc. 50, 288-290 (1967).
25. N. H. Brett, M. Gonzalez, J. Bouillot, and J. C. Niepce, “Neutron and x-ray diffraction studies on pure and magnesia-doped zirconia gels decomposed in vacuo, ” J. Mater. Sci 19, 13491358 (1984).
26. O. Ruff and F. Ebert, “Ceramics of highly refractory materials, ” Z. Anorg. Allgem. Chem. 180, 19-41 (1929).
27. 12 in MgO partially stabilized zirconia, ” in Science and Technology of Zirconia II, Vol. 12 of Advances in Ceramics, N. Claussen, M. Ruhle, and A. H. Heuer, eds. (The American Ceramic Society, Inc., Columbus, Ohio, 1984), pp. 139-151.
28. D. L. Wood and K. Nassau, “Refractive index of cubic zirconia stabilized with yttria, ” Appl. Opt. 21, 2978-2981 (1982).
29. 3 films in the ultraviolet and visible region for interferometric applications, ” Appl. Phys. A 63, 195-202 (1996).
30. B. Bovard, F. J. Van Milligen, M. J. Messerly, S. G. Saxe, and H. A. Macleod, “Optical constants derivation for an inhomoge-neous thin film from in situ transmission measurements, ” Appl. Opt. 24, 1803-1807 (1985).
31. D. P. Arndt, R. M. A. Azzam, J. M. Bennett, J. P. Borgogno, C. K. Carniglia, W. E. Case, J. A. Dobrowolski, U. J. Gibson, T. Tuttle Hart, F. C. Ho, V. A. Hodgkin, W. P. Klapp, H. A. Macleod, E. Pelletier, M. K. Purvis, D. M. Quinn, D. H. Strome, R. Swenson, P. A. Temple, and T. F. Thonn, “Multiple determination of the constants of thin-film coating materials, ” Appl. Opt. 23, 3571-3596 (1984).
32. M. Nowak, “Determination of optical constants and average thickness of inhomogeneous-rough thin films using spectral dependence of optical transmittance, ” Thin Solid Films 254, 200-210 (1995).
33. J. P. Borgogno, B. Lazarides, and E. Pelletier, “Automatic determination of the optical constants of inhomogeneous thin films, ” Appl. Opt. 21, 4020-4029 (1982).
34. E. E. Khawaja, “The determination of the refractive index and thickness of a transparent film, ” J. Phys. D. 9, 1939-1943 (1976).
35. R. Swanepoel, “Determination of the thickness and optical constants of amorphous silicon, ” J. Phys. E 16, 1214-1222 (1983).
36. J. P. Borgogno, P. Bousquet, F. Flory, B. Lazarides, E. Pelletier, and P. Roche, “Inhomogeneity in films: limitation of the accuracy of optical monitoring of thin films, ” Appl. Opt. 20, 90-94 (1981).
37. M. Harris, H. A. Macleod, S. Ogura, E. Pelletier, and B. Vidal, “The relationship between optical inhomogeneity and film structure, ” Thin Solid Films 57, 173-178 (1979).
38. S. Ogura, “Dynamic characteristics in optically inhomoge-neous films, ” in Thin Films for Optical Systems, K. H. Guenther, ed., Proc. SPIE 1782, 377-388 (1992).
39. G. Ghosh, “Sellmeier coefficients and dispersion of thermooptic coefficients for some optical glasses, ” Appl. Opt. 36, 1540-1546 (1997).
40. 2 content, rare-gas type and cathode voltage, ” J. Vac. Sci Technol. A 7, 1235-1239 (1989).
41. 2 films, ” J. Appl. Phys. 66, 2756-2758 (1989).
42. C.-K. Kwok and C. R. Aita, “Indirect band gap in a- ZrO2, ” J. Vac. Sci Technol. A 8, 3345-3346 (1990).
43. A. V. Tikhonravov, M. K. Trubetskov, A. N. Tikhonov, O. B. Tcsherednichenko, B. G. Lysoi, K. V. Mikhailova, B. T. Sullivan, and J. A. Dobrowolski, “Study of thin film inhomogeneity with a fast-scanning acoustooptic spectrophotometer, ” in Developments in Optical Component Coatings, I. Reid, ed., Proc. SPIE 2776, 212-220 (1996).
44. A. F. Hebard. A. T. Fiory, S. Nakahara, and R. H. Eick, “Oxygen-rich polycrystalline magnesium oxide—a high quality thin-film dielectric, ” Appl. Phys. Lett. 48, 520-522 (1986).
45. A. Kucirkova, K. Navratil, L. Pajasova, and V. Vorlicek, “Influence of oxygen concentration on optical properties of semi-insulating polycrystalline silicon films, ” Appl. Phys. A 63, 495-503 (1996).
46. F. Jones, “High-rate reactive sputter deposition of zirconium dioxide, ” J. Vac. Sci. Technol. A 6, 3088-3097 (1988).
47. E. E. Khawaja, F. Bouamrane, A. B. Hallak, M. A. Daous, and M. A. Salim, “Observation of oxygen enrichment in zirconium oxide films, ” J. Vac. Sci Technol. A 11, 580-587 (1993).
48. M. Yoshitake, K. Takiguchi, Y. Suzuki, and S. Ogawa, “Effect of oxygen pressure in reactive ion-beam sputter deposition of zirconium oxides, ” J. Vac. Sci. Technol. A 6, 2326-2332 (1988).
49. 2 films by ion-assisted deposition, ” J. Appl. Phys. 55, 235-241 (1984).
50. 2 thin films prepared by ion-assisted deposition, ” Appl. Opt. 35, 5545-5552 (1996).
51. R. E. Klinger and C. K. Carniglia, “Optical and crystalline inhomogeneity in evaporated zirconia films, ” Appl. Opt. 24, 3184-3187 (1985).
52. J. A. Dobrowolski, P. D. Grant, R. Simpson, and A. J. Waldorf, “Investigation of the evaporation process conditions on the optical constants of zirconia films, ” Appl. Opt. 28, 3997-4005 (1989).
53. P. Vuoristo, T. Mantyla, P. Kettunen, and R. Lappalainen, “RBS analysis of sputter-deposited MgO films, ” Vacuum 42, 1001-1004 (1991).
54. C. Deumie, R. Richier, P. Dumas, and C. Amra, “Multiscale roughness in optical multilayers: Atomic force microscopy and light scattering, ” Appl. Opt. 35, 5583-5594 (1996).
55. F. Biscarini, P. Samori, A. Lauria, P. Ostoja, R. Zamboni, C. Taliani, P. Viville, R. Lazzaroni, and J. L. Bredas, “Morphology and roughness of high-vacuum sublimed oligomer thin films, ” Thin Solid Films 284-285, 439-443 (1996).
56. C. Amra, C. Deumie, D. Torricini, P. Roche, R. Galindo, P. Dumas, and F. Salvan, “Overlapping of roughness spectra measured in macroscopic (optical) and microscopic (AFM) bandwidths, ” in Optical Interference Coatings, F. Abeles, ed., Proc. SPIE 2253, 614-630 (1994).
57. A. Duparre and S. Jakobs, “Combination of surface characterization techniques for investigating optical thin-film components, ” Appl. Opt. 35, 5052-5058 (1996).
58. T. K. S. Wong and W. K. Man, “Scanning probe microscopy and tunneling measurements of polycrystalline tin oxide films, ” Thin Solid Films 287, 45-50 (1996).
59. I. Y. Sokolov, “On the recovery of the spectroscopic image in atomic force microscopy, ” J. Vac. Sci. Technol. A 14, 2901-2904 (1996).
60. 2 (111) substrates, ” Thin Solid Films 280, 5-15 (1996).
61. P. Duwez and F. Odell, “Phase relationships in the system zirconia-ceria, ” J. Am. Ceram. Soc. 33, 274-283 (1950).
62. W. H. Hall, “X-ray line broadening in metals, ” Proc. Phys. Soc. London Sec. A 62, 741-743 (1949).
63. R. Jenkins and R. L. Snyder, Introduction to X-ray Powder Diffractometry (Wiley-Interscience, New York, 1996).
64. B. Lewis and J. C. Anderson, Nucleation and Growth of Thin Films (Academic, New York, 1978).
65. H. A. Macleod, Thin Film Optical Filters, 2nd ed. (Macmillan, New York, 1986), Chap. 6, p. 194.