Morphology and roughness of high-vacuum sublimed oligomer thin films

Thin Solid Films

Volumn 284-285, Issue , 1996, Pages 439-443

  Biscarini, F ^a   Samori P ^a,c   Lauria, A ^a   Ostoja, P ^a   Zamboni, R ^a   Taliani, C ^a   Viville, P ^b   Lazzaroni, R ^b   Bredas J L ^b  

^a CNR   (Italy)

^b UNIVERSITY OF MONS   (Belgium)

^c UNIVERSITY OF BOLOGNA   (Italy)

Author keywords

Growth mechanism; Organic substances; Roughness scaling analysis; Scanning probe microscopy

Indexed keywords

AGGREGATES; ANNEALING; ATOMIC FORCE MICROSCOPY; EVAPORATION; FILM GROWTH; FILM PREPARATION; GRAIN BOUNDARIES; MORPHOLOGY; OLIGOMERS; ORGANIC COMPOUNDS; SUBLIMATION; SURFACE ROUGHNESS;

KARDAR PARISI ZHANG UNIVERSALITY CLASS; ROUGHNESS SCALING ANALYSIS; SCANNING PROBE MICROSCOPY; SELF AFFINE BEHAVIOR;

THIN FILMS;

EID: 0030235449     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(95)08361-8     Document Type: Article

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