Multiscale roughness in optical multilayers: Atomic force microscopy and light scattering

Applied Optics

Volumn 35, Issue 28, 1996, Pages 5583-5594

  Deumie C ^a   Richier, R ^a   Dumas, P ^a   Amra, Claude ^a  

^a CNRS   (France)

Author keywords

Atomic force microscopy; Electron beam deposition; Frequency bandwidth; Ion assisted deposition; Ion plating deposition; Light scattering; Multiscale roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; BANDWIDTH; CALCULATIONS; DEPOSITION; ELECTRON BEAMS; ION BEAMS; LIGHT SCATTERING; OPTICAL MULTILAYERS; OXIDES; SURFACE ROUGHNESS; THIN FILMS; ULTRAVIOLET SPECTROSCOPY;

ELECTRON BEAM EVAPORATION; IMAGE CURVATURE; ION ASSISTED DEPOSITION; ION PLATING; MULTISCALE ROUGHNESS;

OPTICAL FILMS;

EID: 0030270174     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.35.005583     Document Type: Article

References (14)

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