Preparation and characterization of ultra-thin ferroelectric PZT films grown by plasma-assisted CVD

Journal of Crystal Growth

Volumn 272, Issue 1-4 SPEC. ISS., 2004, Pages 789-794

  Nishida, Ken ^a   Shirakata, Ken ^a   Osada, Minoru ^b   Katoda, Takashi ^a  

^a KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

A3. Metalorganic vapor phase epitaxy; B1. Oxides; B2. Ferroelectric materials

Indexed keywords

FERROELECTRIC MATERIALS; FILM GROWTH; INTERFACES (MATERIALS); LEAD COMPOUNDS; METALLORGANIC VAPOR PHASE EPITAXY; MONOLAYERS; OXIDES; SEMICONDUCTING LEAD COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

FERROELECTRIC PROPERTIES; FILM QUALITY; LEAD ZIRCONATE TITANATE (PZT) FILMS; PLASMA ASSISTED CHEMICAL VAPOR DEPOSITION;

ULTRATHIN FILMS;

EID: 9944254118     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2004.08.084     Document Type: Conference Paper

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