A comparative study of the mechanical strength of chemical vapor-deposited diamond and physical vapor-deposited hard coatings

Thin Solid Films

Volumn 473, Issue 1, 2005, Pages 123-131

  Kamiya, S ^a   Nagasawa, H ^b   Yamanobe, K ^b   Saka, M ^b  

^a NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Adhesion; Chemical vapor deposition (CVD); Mechanical properties; Physical vapor deposition (PVD); Toughness

Indexed keywords

ADHESION; ALUMINUM NITRIDE; CHEMICAL VAPOR DEPOSITION; DIAMONDS; STRAIN; STRENGTH OF MATERIALS; TITANIUM NITRIDE; TOUGHNESS; WEAR RESISTANCE;

FILM-SUBSTRATE SYSTEMS; PHYSICAL VAPOR DEPOSITION (PVD); RESIDUAL STRAIN;

THIN FILMS;

EID: 9744261713     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.05.135     Document Type: Article

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