Fracture toughness of the interface between CVD diamond film and silicon substrate in the relation with methane concentration in the source gas mixture

Diamond and Related Materials

Volumn 10, Issue 3-7, 2001, Pages 760-764

  Takahashi, H ^a   Kamiya, S ^a   Saka, M ^a   Abe H ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

CVD diamond; Diamond properties and applications; Film; Toughness of interface

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FRACTURE TOUGHNESS; INTERFACES (MATERIALS); METHANE; SILICON; SUBSTRATES;

ADHESIVE STRENGTH; SILICON SUBSTRATES;

DIAMOND FILMS;

DIAMOND;

EID: 0035269286     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00608-7     Document Type: Article

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