Absorbance and outgasing of photoresist polymeric materials for UV lithography below 193 nm including 157 nm lithography

Microelectronic Engineering

Volumn 53, Issue 1, 2000, Pages 123-126

  Cefalas, A C ^a   Sarantopoulou, E ^a   Gogolides, E ^b   Argitis, P ^b  

^a INSTITUTE OF BIOLOGY   (Greece)

^b INSTITUTE OF MICROELECTRONICS   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; AROMATIC POLYMERS; CHEMICAL BONDS; EXCIMER LASERS; LASER BEAMS; MASS SPECTROMETRY; MONOCHROMATORS; PHOTOMULTIPLIERS; SILICON; ULTRAVIOLET RADIATION;

ALIPHATIC POLYMERS; ULTRAVIOLET LITHOGRAPHY;

PHOTORESISTS;

EID: 0034206894     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(00)00278-1     Document Type: Article

References (9)

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