Nitriding of tetragonal zirconia in a high current d.c. plasma source

Thin Solid Films

Volumn 425, Issue 1-2, 2003, Pages 113-116

  Delachaux, T ^a   Hollenstein, Ch ^a   Levy F ^a   Verdon, C ^b  

^a EPFL   (Switzerland)

^b ASULAB   (Switzerland)

Author keywords

Glow discharge; Nitrides; Plasma processing and deposition; Zirconia

Indexed keywords

FREE RADICALS; GLOW DISCHARGES; HARDNESS; NITRIDING; OPTICAL PROPERTIES; PLASMA SOURCES; THERMAL EFFECTS; TOUGHENING; TRANSMISSION ELECTRON MICROSCOPY; WEAR RESISTANCE; X RAY DIFFRACTION ANALYSIS;

PLASMA DEPOSITION;

ZIRCONIA;

EID: 0037415941     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01132-X     Document Type: Article

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