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Volumn 85, Issue 15, 2004, Pages 3316-3318

Patterning conductive copper by nanotransfer printing

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE COPPER; NANOTRANSFER PRINTING; PATTERNING;

EID: 8644277183     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1803916     Document Type: Article
Times cited : (65)

References (30)
  • 1
    • 8644267115 scopus 로고    scopus 로고
    • edited by R. L. Opila, I. Ali, Y. A. Arimoto, Y. Homma, C. Redisema-Simpson, and K. B. Sundaram (The Electrochemical Society, Pennington, NJ)
    • K. Wijekoon, S. Tsai, D. Bennet, and F. Redeker, Chemical Mechanical Planarization in IC Device Manufacturing III, edited by R. L. Opila, I. Ali, Y. A. Arimoto, Y. Homma, C. Redisema-Simpson, and K. B. Sundaram (The Electrochemical Society, Pennington, NJ, 1999), pp. 158-162.
    • (1999) Chemical Mechanical Planarization in IC Device Manufacturing III , pp. 158-162
    • Wijekoon, K.1    Tsai, S.2    Bennet, D.3    Redeker, F.4
  • 12
    • 8644287844 scopus 로고
    • US Patent No. 5,132,248 (21 July)
    • T. Drummond, A. Arbor, and D. Ginley, US Patent No. 5,132,248 (21 July 1992).
    • (1992)
    • Drummond, T.1    Arbor, A.2    Ginley, D.3
  • 14
    • 79956027794 scopus 로고    scopus 로고
    • Y.-L. Loo, R. L. Willett, K. W. Baldwin, and J. A. Rogers, J. Am. Chem. Soc. 124, 7654 (2002); Appl. Phys. Lett. 80, 562 (2002).
    • (2002) Appl. Phys. Lett. , vol.80 , pp. 562
  • 15
    • 8644290494 scopus 로고    scopus 로고
    • note
    • 4OH because AFM analysis indicated that HCl etching resulted in a smoother surface (rms=0.4 nm).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.