In situ infrared spectroscopic study on a titanium source in MOCVD

Journal of the Electrochemical Society

Volumn 151, Issue 10, 2004, Pages

  Nakamura, Toshihiro ^a   Nishimura, Takuro ^a   Momose, Shun ^a   Tachibana, Kunihide ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; IN SITU PROCESSING; INFRARED SPECTROSCOPY; METALLORGANIC CHEMICAL VAPOR DEPOSITION; OXIDATION; PYROLYSIS; STRUCTURE (COMPOSITION); THERMODYNAMIC STABILITY; TITANIUM;

CHEMICAL STABILITY; CRYSTALLINITY; IN SITU INFRARED ABSORPTION SPECTROSCOPY; MICRODISCHARGE OPTICAL EMISSION SPECTROSCOPY;

ELECTROCHEMISTRY;

EID: 8644271728     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1784151     Document Type: Article

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