Formation mechanism of strontium and titanium oxide films by metalorganic chemical vapor deposition: An isotopic labeling study using 18O2

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 11, 2001, Pages 6619-6622

  Arai, Hisayoshi ^a,b   Tajima, Yusuke ^b   Takeuchi, Kazuo ^a,b  

^a SAITAMA UNIVERSITY   (Japan)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

Author keywords

(Ba,Sr)TiO3; 18O2; Isotope labeling; MOCVD; Sr(DPM)2; SrO; SrTiO3; Ti(T BuO)2(DPM)2; TiO2; TOF SIMS

Indexed keywords

DECOMPOSITION; ISOTOPES; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NEGATIVE IONS; OXIDATION; OXYGEN; PERMITTIVITY; POSITIVE IONS; SECONDARY ION MASS SPECTROMETRY; STRONTIUM COMPOUNDS; TITANIUM OXIDES;

ISOTOPIC LABELING; ISOTOPIC RATIO; NEGATIVE SECONDARY ION DETECTION MODES; OXIDANT GAS; POSITIVE SECONDARY ION DETECTION MODES; STRONTIUM OXIDE FILMS;

MOLECULAR PHYSICS;

EID: 0036153064     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)