Modern vacuum physics

Modern Vacuum Physics

Volumn , Issue , 2004, Pages 1-342

  Chambers, Austin ^a  

^a UNIVERSITY OF YORK   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 85057393121     PISSN: None     EISSN: None     Source Type: Book    
DOI: None     Document Type: Book

References (168)

1. Akimichi H, Arai T, Takeuchi K, Tuzi Y, and Arakawa I, 1997, J. Vac. Sci. Technol., A15, 753.
2. Alpert D, Matland CG, and McCoubrey AC, 1951, Rev. Sci. Instrum., 22, 370.
3. Andrade EN da C, 1960, Advances in Vacuum Science and Technology, Proceedings of the 1st International Congress on Vacuum Techniques, E Thomas, Ed., 14, Pergamon Press, New York.
4. Arnold PC and Borichevsky SC, 1994, J. Vac. Sci. Technol., A12, 568–573.
5. Atkins PW, 1998, Physical Chemistry, 6th ed., Oxford University Press, Oxford, U.K.
6. Barish BC and Weiss R, 1999, Phys. Today, 52(10), 44–49.
7. Bayard RT and Alpert D, 1950, Rev. Sci. Inst., 21, 571.
8. Beams JW, Spitzer DM, Jr., and Wade JP, Jr., 1962, Rev. Sci. Inst., 33, 151.
9. Beams JW, Young JL, and Moore JW, 1946, J. Appl. Phys., 17, 886.
10. Becker W, 1958, Vak.–Tech., 7, 149.
11. Beeck U and Reich G, 1972, J. Vac. Sci. Technol., 9, 126.
12. Bennett JRJ, 1987, J. Vac. Sci. Technol., A5, 2363–2366.
13. Benvenuti C and Hauer M, 1980, Proceedings of the 8th Int. Vac. Congress (Cannes) Vol. 2, p. 199, Société Francaise du Vide, Paris.
14. Berman A, 1996, Vacuum, 47, 327.
15. Bigelow WC, 1994, Vacuum Methods in Electron Microscopy, Portland Press, London.
16. Butler BP, Music V, and Redgrave FJ, 1999, Vacuum, 53, 163–166.
17. Carter G and Colligon JS, 1968, Ion Bombardment of Solids, Heinemann, London.
18. Chapman S and Cowling TG, 1991, The Mathematical Theory of Non-Uniform Gases, 3rd ed., Cambridge University Press, Cambridge, U.K.
19. Chew AD, 1999, Vacuum, 53, 243–246.
20. Clausing P, 1932, Ann. Phys.–Leipzig, 12, 961
21. English translation J. Vac. Sci. Technol., 8, 636–646, 1971, courtesy Veeco Instruments Inc.
22. Cole RJ, 1976, Rarefied Gas Dynamics, 10(1), 261–272.
23. Comsa G, 1994, Surface Science, 299/300, 77–91.
24. Comsa G, Fremery JK, Lindenau B, Messer G, and Rohl P, 1980, J. Vac. Sci. Technol., 17, 642.
25. Davis DH, 1960, J. Appl. Phys., 31, 1169–1176.
26. Dawson PH, Ed., 1976, Quadrupole Mass Spectrometry and its Applications, Elsevier, New York.
27. Dayton BB, 1957, Vacuum Symposium Transactions, (1956), pp. 5–11, Pergamon Press, London.
28. Dayton BB, 1962, Transactions of the 8th National Vacuum Symposium, 1961, Vol. 1, p. 42, Pergamon Press, New York.
29. Dayton BB, 1998, in Foundations of Vacuum Science and Technology, J Lafferty, Ed., John Wiley & Sons, New York.
30. De Boer JH, 1953, The Dynamical Character of Adsorption, Clarendon Press, Oxford, U.K.
31. De Boer JH, 1969, in Molecular Processes on Solid Surfaces, Drauglis E, Gretz RJ, and Jaffee RI, Eds., McGraw-Hill, New York.
32. Delchar TA, 1993, Vacuum Physics and Techniques, Chapman and Hall, London.
33. Dennis WTM and Hepple TA, 1968, Vacuum System Design, Chapman and Hall, London.
34. Deschamps J and Doyeux H, 1997, Phys. World, 10, 39–43.
35. Drinkwine MJ and Lichtman D, 1995, Partial Pressure Analysers and Analysis, AVS Monograph Series, AIP Press, Woodbury, NY.
36. Duesing G, 1987, Vacuum, 37, 309–315.
37. Durakiewicz T and Halas S, 1995, Vacuum, 46 101.
38. Dushman S, 1962, Scientific Foundations of Vacuum Technique, 2nd ed., Lafferty JM, Ed., John Wiley & Sons, New York.
39. Dylla HF, 1998, in Handbook of Vacuum Science and Technology, Hoffmann DM, Singh B, and Thomas JH, Eds., Academic Press, San Diego, CA.
40. Edwards JG and Gilles PW, 1966, J. Chemical Phys., 44, 4426–4430.
41. Ellefson RE, 1998, in Foundations of Vacuum Science and Technology, J Lafferty, Ed., John Wiley & Sons, New York.
42. Elsey RJ, 1975, Vacuum, 25, 299–306 and 347–352.
43. Ettlinger E, et al., 1999, Reports on Science and Technology.
44. Fay JA, 1994, Introduction to Fluid Mechanics, MIT Press, Cambridge, MA.
45. Feather R, 1961, An Introduction to the Physics of Vibrations and Waves, Edinburgh University Press, Edinburgh.
46. Ferrario B, 1998, in Foundations of Vacuum Science and Technology, J Lafferty, Ed., John Wiley & Sons, New York.
47. Field D, 2001, Contemp. Phys., 42(5), 275–283.
48. Fremerey JK, 1982, Vacuum, 32, 685.
49. Fremerey JK, 1999, Vacuum, 53, 197–201.
50. Frenkel J, 1924, Z. Physik, 26, 117.
51. Glang R, 1970, in Handbook of Thin Film Technology, Maissel LI and Glang R, McGraw-Hill, New York.
52. Green GW, 1968, The Design and Construction of Small Vacuum Systems, Chapman and Hall, London.
53. Gröbner O, 1996, Vacuum, 47, 591–595.
54. Hablanian M, 1984, J. Vac. Sci. Technol., A2(2), 118–126.
55. Hablanian M, 1997, High Vacuum Technology, 2nd ed., Marcel Dekker, New York.
56. Haken H and Wolf HC, 1996, The Physics of Atoms and Quanta, Springer, Berlin.
57. Halliday BS, 1998, in Basic Vacuum Technology, Chambers A, Fitch RK, and Halliday BS, IOP, Bristol, U.K.
58. Harms AA, Schoepf KF, Miley GH, and Kingdon DR, 2000, Principles of Fusion Energy, World Scientific.
59. Harris NS, 2005, Modern Vacuum Practice, 3rd ed. contact author at nigel.harris1@ virgin.net. Also available from BOC Edwards; call 01.293.528844 (U.K.) or 1-800-848-9800 (U.S.).
60. Helmer JC and Hayward WH, 1966, Rev. Sci. Instrum., 37, 1652.
61. Henning H, 1998, in Foundations of Vacuum Science and Technology, J Lafferty, Ed., John Wiley & Sons, New York.
62. Hinkle LD, 1998, in Handbook of Vacuum Science and Technology, Hoffmann DM, Singh B and Thomas JH, Ed., Academic Press, San Diego, CA.
63. Hinkle LD and Uttaro FL, 1996, Vacuum, 47, 523.
64. Hobson JP 1961, Transactions of the 8th National Vacuum Symposium, Vol. 1, p. 26, Pergamon Press, New York.
65. Hobson JP and Redhead PA, 1958, Can. J. Phys., 36, 271.
66. Hobson JP and Salzman DB, 2000, J. Vac. Sci. Technol., A18(4), 1758–1765.
67. Holkeboer DH, Jones DW, Pagano F, and Santeler DJ, 1993, Vacuum Technology and Space Simulation, American Vacuum Society Classics, AIP, New York.
68. Hudson JB, 1992, Surface Science, an Introduction, Butterworth–Heinemann, Boston, MA.
69. Hudson JB, 1998, in Foundations of Vacuum Science and Technology, Lafferty JM, Ed., John Wiley & Sons, New York.
70. James AP, 1987, Vacuum, 37, 677.
71. Jaeger RC, 2002, Introduction to Microelectronic Fabrication, 2nd ed., Addison-Wesley Reading, MA.
72. Jeans JH, 1982, An Introduction to The Kinetic Theory of Gases, Cambridge University Press, Cambridge, U.K.
73. Jitschin W, Migwi JK, and Grosse G, 1990, Vacuum, 40, 293.
74. Ju L, Blair DG, and Zhao C, 2000, Rep. Prog. Phys., 63, 1317–1427.
75. Kaminsky M, 1965, Atomic and Ionic Impact Phenomena on Metal Surfaces, Springer, Berlin.
76. Kaye GWC and Laby TH, 1995, Physical and Chemical Constants, 16th ed., John Wiley & Sons, New York.
77. Kempe’s Engineers Year-Book 2001, CMP Information Ltd., Tonbridge, U.K.
78. Kendall BRF and Drubetsky E, 1997, J. Vac. Sci. Technol., A15, 740.
79. Kennard EH, 1938, Kinetic Theory of Gases, McGraw-Hill, New York.
80. Knudsen M, 1909, Ann. Phys. Lpz., 28, 75–130.
81. Knudsen M, 1934, Kinetic Theory of Gases, Methuen, London.
82. Kruger CH and Shapiro AH, 1961, Transactions of the 7th National Vacuum Symposium (1960), Pergamon, New York, pp. 6–12.
83. Lafferty JM, Ed., 1998, Foundations of Vacuum Science and Technology, John Wiley & Sons, New York.
84. Leck JH, 1970, Vacuum, 20, 369.
85. Leck JH, 1989, Total and Partial Pressure Measurement in Vacuum Systems, Blackie, Glasgow and London.
86. Levenson LL, Milleron N, and Davis DH, 1963, Le Vide, 103, 42.
87. Li M and Dylla HF, 1993, J. Vac. Sci. Technol., A11, 1702–1707;
88. 1994, J. Vac. Sci. Technol., A12, 1772–1777;
89. 1995, J. Vac. Sci. Technol., A13, 1872–1878.
90. Lindenau B, 1988, Vacuum, 38, 893.
91. Lindenau BE and Fremerey JK, 1991, J. Vac. Sci. Technol., A9, 2737–2743.
92. Livesey RG, 1998, in Foundations of Vacuum Science and Technology, Lafferty J, Ed., John Wiley & Sons, New York.
93. Loeb LB, 1961, The Kinetic Theory of Gases, Dover, New York.
94. Luther AC and Inglis AF, 1999, Video Engineering, McGraw-Hill, New York.
95. Madey TE, 1984, J. Vac. Sci. Technol., A2(2), 110–117.
96. Maissel LI and Francombe MH, 1991, An Introduction to Thin Films, Gordon and Breach, New York.
97. McCash EM, 2001, Surface Chemistry, Oxford University Press, Oxford, U.K.
98. McCulloh KE, Wood SD, and Tilford CR, 1985, J. Vac. Sci. Technol., A3, 1738.
99. Morgan DV and Board K, 1994, An Introduction to Semiconductor Microtechnology, John Wiley & Sons, Chichester, U.K.
100. Mossharrafa M, 1970, Ind. Res. Dev., March, p. 24.
101. Nash PJ, 1987, Vacuum, 37, 643.
102. Nash PJ and Thompson TJ, 1983, J. Vac. Sci. Technol., A1, 172.
103. Oatley CW, 1957, Br. J. Appl. Phys., 8, 15.
104. O’Hanlon JF, 1994, J. Vac. Sci. Technol., A12, 921–926.
105. O’Hanlon JF, 2003, A User’s Guide to Vacuum Technology, 3rd ed., John Wiley & Sons, New York.
106. Orchard JC and Scales SC, 1999, Vacuum, 53, 357–361.
107. Peacock RN, Peacock NT, and Hauschulz DS, 1991, J. Vac. Sci. Technol., A9, 1987.
108. Peacock RN, 1998, in Foundations of Vacuum Science and Technology, Lafferty J, Ed., John Wiley & Sons, New York.
109. Pendlebury JM, 1985, Kinetic Theory, IOP, Bristol, U.K.
110. Perrin J, 1999, Vacuum Solutions, May/June 25–28, IOP, Bristol, U.K.
111. Pert GJ, 2002, Contemp. Phys., 43, 303–306.
112. Pirani M, 1906, Verh. der Deutsch Phys. Ges., 8, 686.
113. Poulter KF, 1977, J. Phys. E. Sci. Instrum., 10, 112–125.
114. Poulter KF, 1981, Vide-Couches Minces, 36, 521.
115. Poulter KF, Rodgers M-J, Nash PJ, Thompson TJ, and Perkin MP, 1983, Vacuum, 33(6), 311–316.
116. Power BD, 1966, High Vacuum Pumping Equipment, Chapman and Hall, London.
117. Powers MJ, 1998, in Handbook of Vacuum Science and Technology, Hoffmann DM, Singh B, and Thomas JH, Eds., Academic Press, San Diego, CA.
118. Prescott J, 1961, Applied Elasticity, Dover, New York.
119. Present RD, 1958, Kinetic Theory of Gases, McGraw-Hill, New York.
120. Redhead PA, 1960, Rev. Sci. Instrum., 31, 343.
121. Redhead PA, 1984, J. Vac. Sci. Technol., A2(2), 132–138.
122. Redhead PA, 1987, J. Vac. Sci. Technol., A5, 3215.
123. Redhead PA, 1993, Vacuum, 44, 559–564.
124. Redhead PA, 1998, in Foundations of Vacuum Science and Technology, Lafferty J, Ed., John Wiley & Sons, New York.
125. Redhead PA, 1999, Vacuum, 53, 137–149.
126. Redhead PA, Hobson JP, and Kornelsen EV, 1968, The Physical Basis of Ultra-high Vacuum, reprinted 1993 in AVS Classics Series, AIP Press, Woodbury, NY.
127. Reid RJ, 1982, J. Vac. Sci. Technol., 20, 1156–1158.
128. Reid RJ, 1997, Vacuum Solutions, 1.1, IOP, Bristol, U.K.
129. Reif F, 1965, Fundamentals of Statistical and Thermal Physics, McGraw-Hill, New York.
130. Roth A, 1990, Vacuum Technology, 3rd ed., Elsevier Science, Amsterdam.
131. Santeler DJ, 1986, J. Vac. Sci. Technol., A4, 348–352 and 338–343.
132. Santeler DJ and Boeckmann MD, 1987, J. Vac. Sci. Technol., A5, 2493–2496.
133. Sears FW, 1965, An Introduction to Thermodynamics, Kinetic Theory of Gases, and Statistical Mechanics, Addison-Wesley, Reading, MA.
134. Sears FW and Sallinger GL, 1986, Thermodynamics, Kinetic Theory, and Statistical Mechanics, Addison-Wesley, Reading, MA.
135. Shah SI, 1995, Handbook of Thin Film Process Technology, IOP, Bristol, U.K.
136. Shah I, 1997, Phys. World, 10, 45–47.
137. Shin YH, Lee KJ, and Chung Jhung KH, 1996, Vacuum, 47, 679.
138. Singleton JH, 1998, in Handbook of Vacuum Science and Technology, Hoffmann DM, Singh B, and Thomas JH, Eds., Academic Press, San Diego, CA.
139. Singleton JH, 2001, J. Vac. Sci. Technol., A19, 1712–1719.
140. Somorjai GA, 1994, Introduction to Surface Chemistry and Catalysis, John Wiley & Sons, New York.
141. Steckelmacher W, 1966, Vacuum, 16, 561–583.
142. Steckelmacher W, 1986, Rep. Prog. Phys., 49, 1083–1107.
143. Steckelmacher W, 1987, Vacuum, 37, 651.
144. Stuart RV, 1983, Vacuum Technology, Thin Films, and Sputtering, Academic Press, New York.
145. Su Y, Sawada T, Takemito J, and Haga S, 1996, Vacuum, 47, 815–818.
146. Sullivan JJ, 1985, J. Vac. Sci. Technol., A3, 1721.
147. Tate JT and Smith PT, 1932, Phys. Rev., 39, 270.
148. Temperley HNV, 1961, Properties of Matter, University Tutorial Press, London.
149. Tilford CR, Dittman S and McCulloh KE, 1988, J. Vac. Sci. Technol., A6, 2853.
150. Tilford CR, 1990
151. Tilford CR, 1992, Physical Methods of Chemistry, 2nd ed., BW Rossiter and Baetzold, Eds., John Wiley & Sons, pp. 101–73.
152. Tilford CR, Filippelli AR, and Abbott PJ, 1995, J. Vac. Sci. Technol., A13, 485.
153. Trickett BA, 1987, Vacuum, 37, 747–755.
154. Troup AP and Dennis NTM, 1991, J. Vac. Sci. Technol., A9, 2048–2052.
155. Van Atta CM, 1965, Vacuum Science and Engineering, McGraw-Hill, New York.
156. Venables JA, 2000, Introduction to Surface and Thin Film Processes, Cambridge University Press, Cambridge, U.K.
157. Walton AJ, 1983, The Three Phases of Matter, 2nd ed., Clarendon Press, Oxford, U.K.
158. Watanabe F, 1993, J. Vac. Sci. Technol., A11, 1620.
159. Watanabe F, 1996, Vacuum, 47, 567.
160. Welch KM, 1991, Capture Pumping Technology, an Introduction, Pergamon Press, Oxford, U.K.
161. Wehner GK and Anderson GS, 1970, in Handbook of Thin Film Technology, Maissel LI and Glang R, McGraw-Hill, New York.
162. Weston G, 1980, Vacuum, 30, 49.
163. Westwood WD, 2003, Sputter Deposition, American Vacuum Society Education Committee.
164. Woodruff DP and Delchar TA, 1986, Modern Techniques of Surface Science, Cambridge
165. University Press, Cambridge, U.K. Weston G, 1985, Ultrahigh Vacuum Practice, Butterworth, London.
166. Wutz M, Adam H, and Walcher W, 1989, Theory and Practice of Vacuum Technology trans. W Steckelmacher, Vieweg, Braunschweig, Germany.
167. Zee A, 2000, Fearful Symmetry: the search for beauty in modern physics, Princeton University Press, Princeton, NJ.
168. Zemansky MW and Dittman RH, 1997, Heat and Thermodynamics, 7th ed., McGraw-Hill, New York.