Optical thin film formation with O2 cluster ion assisted deposition

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 41, Issue 6 B, 2002, Pages 4291-4294

  Shirai, Ken Ichi ^a,b   Fujiwara, Yu Ji ^a   Takahashi, Rie ^a   Toyoda, Noriaki ^a   Matsui, Shinji ^a   Mitamura, Tohru ^a   Terasawa, Mititaka ^a   Yamada, Isao ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

Average roughness; GCIB assisted deposition; O2 cluster ion; Refractive index; SiO2; Ta2O5

Indexed keywords

INTERFACES (MATERIALS); ION BEAM ASSISTED DEPOSITION; MULTILAYERS; OPTICAL COMMUNICATION; OPTICAL FILMS; OXYGEN; POROSITY; POSITIVE IONS; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SILICA; SURFACE ROUGHNESS;

SMOOTH SURFACES;

THIN FILMS;

EID: 0036614286     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.41.4291     Document Type: Article

References (12)