Etching, smoothing, and deposition with gas-cluster ion beam technology

Surface and Coatings Technology

Volumn 133-134, Issue , 2000, Pages 273-282

  Greer, J A ^a   Fenner, D B ^a   Hautala, J ^a   Allen, L P ^a   DiFilippo, V ^b   Toyoda, N ^c   Yamada, I ^d   Matsuo, J ^d   Minami, E ^d   Katsumata, H ^d  

^a Epion Corporation   (United States)

^b Tufts University   (United States)

^c Massachusetts Institute of Technology Cambridge   (United States)

^d KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; ION BEAMS; IONIZATION; NANOSTRUCTURED MATERIALS; SURFACE ROUGHNESS;

GAS-CLUSTER ION BEAM (GCIB) PROCESSING;

DEPOSITION;

ETCHING;

EID: 0034310620     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)00876-8     Document Type: Article

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