Surface Layer Analysis of Si Sphere by XRF and XPS

IEEE Transactions on Instrumentation and Measurement

Volumn 64, Issue 6, 2015, Pages 1509-1513

  Zhang, Lulu ^a   Azuma, Yasushi ^a   Kurokawa, Akira ^a   Kuramoto, Naoki ^a   Fujii, Kenichi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Chemical analysis; silicon; surface contamination; thickness measurement; X ray spectroscopy

Indexed keywords

CHEMICAL ANALYSIS; FLUORESCENCE; SILICON; SPHERES; SURFACE ANALYSIS; THICKNESS MEASUREMENT; UNCERTAINTY ANALYSIS; X RAY SPECTROSCOPY;

AVOGADRO CONSTANT; CHEMICAL BINDING; CONTAMINATION LAYERS; METALLIC CONTAMINATION; SURFACE CONTAMINATIONS; SURFACE LAYERS; THICKNESS OF THE OXIDE LAYERS; X RAY FLUORESCENCE ANALYSIS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 85027945970     PISSN: 00189456     EISSN: None     Source Type: Journal    
DOI: 10.1109/TIM.2015.2389352     Document Type: Article

References (17)

1. B. Andreas et al., "Counting the atoms in a 28Si crystal for a new kilogram definition," Metrologia, vol. 48, no. 2, pp. S1-S13, 2011.
2. R. A. Nicolaus et al., "Current state of Avogadro 28Si sphere S8," IEEE Trans. Instrum. Meas., vol. 62, no. 6, pp. 1499-1505, Jun. 2013.
3. I. Busch et al., "Surface layer determination for the Si spheres of the Avogadro project," Metrologia, vol. 48, no. 2, pp. S62-S82, 2011.
4. L. Zhang, Y. Azuma, A. Kurokawa, N. Kuramoto, and K. Fujii, "Surface layer analysis of Si sphere by XRF and XPS," in Proc. CPEM, Aug. 2014, pp. 208-209, paper ID318.
5. A. Picard, N. Bignell, M. Borys, S. Downes, and S. Mizushima, "Mass comparison of the 1 kg silicon sphere AVO#3 traceable to the international prototype K," Metrologia, vol. 46, no. 1, pp. 1-10, 2009.
6. N. Kuramoto et al., "Diameter comparison of a silicon sphere for the international Avogadro coordination project," IEEE Trans. Instrum. Meas., vol. 60, no. 7, pp. 2615-2620, Jul. 2011.
7. T. Moriyama, "Analysis of trace impurities in pharmaceutical products using polarized EDXRF spectrometer NEX CG," Rigaku J., vol. 29, no. 2, pp. 19-21, 2013.
8. R. S. Houk, V. A. Fassel, G. D. Flesch, H. J. Svec, A. L. Gray, and C. E. Taylor, "Inductively coupled argon plasma as an ion source for mass spectrometric determination of trace elements," Anal. Chem., vol. 52, no. 14, pp. 2283-2289, 1980.
9. P. J. Cumpson and M. P. Seah, "Elastic scattering corrections in AES and XPS. II. Estimating attenuation lengths and conditions required for their valid use in overlayer/substrate experiments," Surf. Interf. Anal., vol. 25, no. 6, pp. 430-446, 1997.
10. 2 on Si II. Issues in quantification of the oxide thickness," Surf. Interf. Anal., vol. 33, no. 8, pp. 640-652, 2002.
11. 2 on Si," NPL Quality of Life Division, Teddington, U.K., NPL Rep. AS 27, Aug. 2008.
12. S. A. Chambers, "Elastic scattering and interference of backscattered primary, Auger and X-ray photoelectrons at high kinetic energy: Principles and applications," Surf. Sci. Rep., vol. 16, no. 6, pp. 261-331, 1992.
13. Z.-L. Han et al., "Structural effects in single-crystal photoelectron, Auger-electron, and Kikuchi-electron angular diffraction patterns," Surf. Sci., vol. 258, nos. 1-3, pp. 313-327, 1991.
14. 2 on Si. I. Quantifying and removing carbonaceous," J. Vac. Sci. Technol. A, vol. 21, no. 2, pp. 345-352, 2003.
15. S. Tanuma, C. J. Powell, and D. R. Penn, "Calculations of electorn inelastic mean free paths. II. Data for 27 elements over the 50-2000 eV range," Surf. Interf. Anal., vol. 17, no. 13, pp. 911-926, 1991.
16. S. Tanuma, C. J. Powell, and D. R. Penn, "Calculations of electron inelastic mean free paths. IX. Data for 41 elemental solids over the 50 eV to 30 keV range," Surf. Interf. Anal., vol. 43, no. 3, pp. 689-712, 2011.
17. C. J. Powell and A. Jablonski, "Evaluation of calculated and measured electron inelastic mean free paths near solid surfaces," J. Phys. Chem. Ref. Data, vol. 28, no. 1, pp. 19-62, 1999.