Thin film deposition of Ta, TaN and Ta/TaN bi-layer on Ti and SS316-LVM substrates by RF sputtering

Surface and Coatings Technology

Volumn 309, Issue , 2017, Pages 887-896

  Jara, A ^a   Fraisse, B ^b   Flaud, V ^b   Frety N ^b   Gonzalez, G ^c  

^a UNIVERSIDAD CENTRAL DE VENEZUELA   (Venezuela)

^b UNIVERSITÉ DE MONTPELLIER   (France)

^c INSTITUTO VENEZOLANO DE INVESTIGACIONES CIENTÍFICAS   (Venezuela)

Author keywords

Characterization; RF sputtering; Ta; TaN and Ta TaN thin films

Indexed keywords

CHARACTERIZATION; DEPOSITION; MICROSTRUCTURE; SPUTTERING; SUBSTRATES; TANTALUM;

BI-LAYER; DIFFERENT SUBSTRATES; RF-SPUTTERING; THIN-FILM DEPOSITIONS;

THIN FILMS;

EID: 85005992550     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2016.10.067     Document Type: Article

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