Epitaxial growth of GaN films on atomically stepped (0001) lithium-niobate (LiNbO3) substrates

Journal of the Korean Physical Society

Volumn 58, Issue 5, 2011, Pages 1369-1373

  Nam, Man Hoai ^a   Yang, Woochul ^a   Kim, Moon Duck ^b   Park, In Sung ^c  

^a Dongguk University   (South Korea)

^b Chungnam National University   (South Korea)

^c Hanyang University   (South Korea)

Author keywords

GaN; Lithium niobate (LiNbO3); Molecular beam epitaxy (MBE); Stepped surface

Indexed keywords

EID: 84987875648     PISSN: 03744884     EISSN: 19768524     Source Type: Journal    
DOI: 10.3938/jkps.58.1369     Document Type: Article

References (19)

1. S. Nakamura et al., Jpn. J. Appl. Phys. 36, L1568 (1997).
2. J. Khurgin, Y. J. Ding and D. Jena, Appl. Phys. Lett. 92, 252104 (2007).
3. H. Morkoc, Nitride Semiconductors and Devices (Springer, Heidelberg, 1999).
4. R. G. Powell, N. Lee, Y. Kim and J. E. Greene, J. Appl. Phys. 73, 189 (1993).
5. G. Namkoong, K.-K. Lee, S. M. Madison, W. Henderson, S. E. Ralph and W. A. Doolittle, Appl. Phys. Lett. 87, 171107 (2005).
6. K.-K. Lee, G. Namkoong, S. M. Madison, S. E. Ralph, W. A. Doolittle, M. Losurdo, G. Bruno and H. K. Cho, Mater. Sci. Eng., B 140, 203 (2007).
7. Y. Tsuchiya, A. Kobayashi, J. Ohta, H. Fujioka and M. Oshimain, Jpn. J. Appl. Phys. 44, L1522 (2005).
8. C.-W. Yang, B. J. Rodriguez, A. Gruverman and R. J. Nemanich, J. Phys. Condens. Matter 17, S1415 (2005).
9. T. A. Rost, H. Kin and T. A. Rabson, Appl. Phys. Lett. 59, 3654 (1991).
10. T. Moudakir, G. Orsal, N. Malouti, A. A. Sirenko, S. Gautier, M. Bouchaour, S. Ould Saad, J. P. Salvestrini and A. Ougazzaden, Eur. Phys. J. Appl. Phys. 43, 295 (2008).
11. I. E. Kalabin, T. I. Grigorieva, L. D. Pokrovsky, D. V. Sheglov, D. I. Shevtsov and V. V. Atuchin, Opt. Commun. 221, 359 (2003).
12. G. H. Lee, Opt. Express 10, 556 (2002).
13. K.-K. Lee, G. Namkoong, W. A. Doolittle, M. Losurdo, G. Bruno and D. H. Jundt, J. Vac. Sci. Technol., B 24, 2093 (2006).
14. Y. Tsuchiya, A. Kobayashi, J. Ohta, H. Fujioka and M. Oshima, Phys. Status Solidi A 202, R145 (2005).
15. L. Wang, X. Liu, Y. Zan, J. Wang, D. Wang, D. Lu and Z. Wang, Appl. Surf. Sci. 197, 384 (2002).
16. C. Park, S. Yeo, J. H. Kim, D. Yoon and T. J. Anderson, Thin Solid Films 498, 94 (2006).
17. H. Teisseyre, X. H. Wu, S. Keller, Y. Li, D. Kapolnek and B. P. Keller, Phys. Rev. B 62, 10151 (2000).
18. B. Heying, E. J. Tarsa, C. R. Elsass, P. Fini, S. P. Den-Baars and J. S. Speck, J. Appl. Phys. 85, 6470 (1999).
19. S. Sanna and W. G. Schmidt, Appl. Surf. Sci. 256, 5740 (2010).