Exploring thiol-yne based monomers as low cytotoxic building blocks for radical photopolymerization

Journal of Polymer Science, Part A: Polymer Chemistry

Volumn 54, Issue 21, 2016, Pages 3484-3494

  Oesterreicher, Andreas ^a   Ayalur Karunakaran, Santhosh ^b   Moser, Andreas ^a   Mostegel, Florian H ^a   Edler, Matthias ^a   Kaschnitz, Petra ^c   Pinter, Gerald ^a   Trimmel, Gregor ^c   Schlögl, Sandra ^b   Griesser, Thomas ^a  

^a UNIVERSITY OF LEOBEN   (Austria)

^b POLYMER COMPETENCE CENTER LEOBEN GMBH   (Austria)

^c GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

low cytotoxicity; photopolymers; thiol yne

Indexed keywords

3D PRINTERS; BIOCOMPATIBILITY; BIOMEDICAL EQUIPMENT; CURING; CYTOTOXICITY; DYNAMIC MECHANICAL ANALYSIS; ETHERS; FUNCTIONAL POLYMERS; GLASS TRANSITION; MAGNETIC RESONANCE SPECTROSCOPY; MANUFACTURE; NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; PHOTOPOLYMERIZATION; PHOTOPOLYMERS; SALTS;

ADDITIVE MANUFACTURING TECHNOLOGY; ETHER DERIVATIVES; LOW CYTOTOXICITIES; NETWORK PROPERTIES; PATIENT SPECIFIC; RADICAL PHOTOPOLYMERIZATION; SOLID STATE NUCLEAR MAGNETIC RESONANCE SPECTROSCOPY; THIOL-YNE;

MONOMERS;

EID: 84979987408     PISSN: 0887624X     EISSN: 10990518     Source Type: Journal    
DOI: 10.1002/pola.28239     Document Type: Article

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