A general concept for monitoring plasma induced charging damage

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn 2003-January, Issue , 2003, Pages 36-39

  Smeets, D ^a   Martin, A ^a   Scarp, A ^b  

^a INFINEON TECHNOLOGIES AG   (Germany)

^b NXP SEMICONDUCTORS   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNAS; ION IMPLANTATION; PLASMA ETCHING;

ANTENNA STRUCTURES; AUTOMATIC PROCEDURES; CHARACTERIZATION TECHNIQUES; MEASURED PARAMETERS; MONITORING MEASUREMENTS; MONITORING PARAMETERS; PLASMA ENHANCED DEPOSITION; PRODUCTION MONITORING;

DAMAGE DETECTION;

EID: 84973598005     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PPID.2003.1199725     Document Type: Conference Paper

References (13)

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