Relation between product yield and plasma process induced damage

International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings

Volumn , Issue , 1998, Pages 7-10

  Luchies, Jan Marc ^a   Simon, Paul ^a   Kuper, Fred ^a   Maly, Wojciech ^a  

^a NXP SEMICONDUCTORS   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANTENNAS; CRYSTAL DEFECTS; ELECTRIC CHARGE; INTEGRATED CIRCUIT TESTING; PLASMA APPLICATIONS; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DEVICE TESTING; THRESHOLD VOLTAGE;

PLASMA CHARGING; PLASMA PROCESS-INDUCED DAMAGE;

CMOS INTEGRATED CIRCUITS;

EID: 0032266286     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)