Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 34, Issue 3, 2016, Pages

  Jackson, David H K ^a   Laskar, Masihhur R ^b   Fang, Shuyu ^a   Xu, Shenzhen ^b   Ellis, Ryan G ^b,d   Li, Xiaoqing ^c   Dreibelbis, Mark ^b   Babcock, Susan E ^a   Mahanthappa, Mahesh K ^a   Morgan, Dane ^b,e   Hamers, Robert J ^a   Kuech, Thomas F ^a  

^a UNIVERSITY OF WISCONSIN MADISON   (United States)

^b Wisconsin Electric Machines and Power Electronics Consortium   (United States)

^c DOW CHEMICAL COMPANY   (United States)

^d PURDUE UNIVERSITY   (United States)

^e University of Minnesota   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COATINGS; ATOMIC LAYER DEPOSITION; BYPRODUCTS; CATHODES; DEPOSITION; DESORPTION; ELECTRIC BATTERIES; ELECTRODES; FILM GROWTH; MANGANESE; POWDERS; SECONDARY BATTERIES; SILICON WAFERS; THIN FILMS;

CHARGE CAPACITIES; CONTINUOUS DEPOSITION; DEPOSITION TEMPERATURES; LOWER TEMPERATURES; OPTIMIZED CONDITIONS; RAPID DECOMPOSITION; REACTION BYPRODUCTS; SILICON SUBSTRATES;

LITHIUM-ION BATTERIES;

EID: 84961602263     PISSN: 07342101     EISSN: 15208559     Source Type: Journal    
DOI: 10.1116/1.4943385     Document Type: Article

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