ALD technology - Present and future challenges

ECS Transactions

Volumn 3, Issue 15, 2006, Pages 15-26

  Haukka, Suvi ^a  

^a ASM Microchemistry Oy   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; FILMS; THROUGHPUT;

ALD TECHNOLOGY; DEPOSITION TECHNIQUE; FUTURE CHALLENGES; GROWTH CHEMISTRY; GROWTH OF THIN FILMS; ORGANIC SURFACES;

ATOMIC LAYER DEPOSITION;

EID: 45749155625     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2721470     Document Type: Conference Paper

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