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Volumn 4, Issue 12, 2016, Pages 2312-2318

Chemical vapour deposition of rhenium disulfide and rhenium-doped molybdenum disulfide thin films using single-source precursors

(5) Al Dulaimi, Naktal a Lewis, David J a Zhong, Xiang Li a Azad Malik, M a O'Brien, Paul a

a UNIVERSITY OF MANCHESTER (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEPOSITION; MOLYBDENUM; MOLYBDENUM COMPOUNDS; PRASEODYMIUM; RADIOACTIVE WASTES; RHENIUM; SEMICONDUCTOR DOPING; SULFUR COMPOUNDS; THIN FILMS; TRANSITION METALS;

AEROSOL-ASSISTED CHEMICAL VAPOUR DEPOSITIONS; CHEMICAL VAPOUR DEPOSITION; EDX SPECTROSCOPY; MOLYBDENUM DISULFIDE; OPTOELECTRONIC PROPERTIES; POLYCRYSTALLINE THIN FILM; SINGLE-SOURCE PRECURSOR; TRANSITION METAL DICHALCOGENIDES;

VAPOR DEPOSITION;

EID: 84961590076 PISSN: 20507534 EISSN: 20507526 Source Type: Journal
DOI: 10.1039/c6tc00489j Document Type: Article

Times cited : (48)

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