Aerosol-assisted chemical vapor deposition of lubricating MoS2 films. Ferrous substrates and titanium film doping

Chemistry of Materials

Volumn 20, Issue 16, 2008, Pages 5438-5443

  McCain, Matthew N ^a   He, Bo ^b   Sanati, Javad ^b   Jane Wang, Q ^a,b   Marks, Tobin J ^a,b  

^a NORTHWESTERN UNIVERSITY   (United States)

^b Northwestern University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOLS; CHEMICAL VAPOR DEPOSITION; FRICTION; IRON COMPOUNDS; LAYERED SEMICONDUCTORS; MOLYBDENUM ALLOYS; MOLYBDENUM COMPOUNDS; NANOPARTICLES; ORGANIC SOLVENTS; ORGANOMETALLICS; OXIDE MINERALS; SEMICONDUCTOR DOPING; STEEL RESEARCH; SUBSTRATES; THIN FILMS; TIO2 NANOPARTICLES; TITANIUM DIOXIDE;

AEROSOL-ASSISTED CHEMICAL VAPOR DEPOSITIONS; FERROUS SUBSTRATE; FRICTION COEFFICIENTS; METAL ORGANIC PRECURSORS; NANOPARTICLE FILMS; PREFERRED ORIENTATIONS; SOLVENT DECOMPOSITIONS; TITANIUM PRECURSORS;

MOLYBDENUM STEEL;

EID: 51049083797     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm7026674     Document Type: Article

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