Athermal Azobenzene-Based Nanoimprint Lithography

Advanced Materials

Volumn 28, Issue 13, 2016, Pages 2624-2628

  Probst, Christian ^a   Meichner, Christoph ^a   Kreger, Klaus ^a   Kador, Lothar ^a   Neuber, Christian ^a   Schmidt, Hans Werner ^a  

^a UNIVERSITY OF BAYREUTH   (Germany)

Author keywords

athermal photofluidization; azobenzene; nanoimprint lithography; nanopatterning; soft lithography

Indexed keywords

AZOBENZENE; ISOMERIZATION; ISOMERS; LITHOGRAPHY; MICROOPTICS;

ATHERMAL PHOTOFLUIDIZATION; AZOBENZENE MOIETY; CAPILLARY FORCE; MICRO-LENS ARRAYS; NANOPATTERNING; PHOTONIC ELEMENTS; SOFT LITHOGRAPHY; THERMODYNAMICALLY STABLE;

NANOIMPRINT LITHOGRAPHY;

AZO COMPOUND; AZOBENZENE; DIMETICONE; NANOMATERIAL;

ATOMIC FORCE MICROSCOPY; CHEMISTRY; ISOMERISM; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; ULTRAVIOLET RADIATION;

AZO COMPOUNDS; DIMETHYLPOLYSILOXANES; ISOMERISM; MICROSCOPY, ATOMIC FORCE; MICROSCOPY, ELECTRON, SCANNING; NANOSTRUCTURES; NANOTECHNOLOGY; ULTRAVIOLET RAYS;

EID: 84956660846     PISSN: 09359648     EISSN: 15214095     Source Type: Journal    
DOI: 10.1002/adma.201505552     Document Type: Article

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