Erratum: Miniaturization of surface patterns by combination of contact etching lithography and multi-step shrinking of stretched polymer films (Polymer Journal 40:6 (534-537) 10.1295/polymj.PJ2008022);Miniaturization of surface patterns by combination of contact etching lithography and multi-step shrinking of stretched polymer films

Polymer Journal

Volumn 40, Issue 6, 2008, Pages 534-537

  Yabu, Hiroshi ^a   Shimomura, Masatsugu ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Contact etching lithography; Pattern miniaturization; Stretched polymer films

Indexed keywords

ETCHING; LITHOGRAPHY; MINIATURE INSTRUMENTS; POLYDIMETHYLSILOXANE; SEMICONDUCTING FILMS; SHRINKAGE; SILICONES;

CONTACT ETCHING LITHOGRAPHY; MULTI-STEP; NOVEL PATTERNS; PATTERN MINIATURIZATION; POLYDIMETHYLSILOXANE PDMS; STRETCHED POLYMER FILMS; SURFACE PATTERN;

POLYMER FILMS;

EID: 49149117227     PISSN: 00323896     EISSN: 13490540     Source Type: Journal    
DOI: 10.1295/polymj.PJ2008022E     Document Type: Erratum

References (9)

1. Y. Xia and G. M. Whitesides, Angew. Chem., Int. Ed., 35, 3523 (2000).
2. J. Lahiri, E. Ostuni, and G. M. Whitesides, Langmuir, 15, 2055 (1999).
3. W. Zhao, H. Y. Low, and P. S. Suresh, Langmuir, 22, 5520 (2006).
4. Y. Lin, M. H. Hong, T. C. Chong, C. S. Lim, G. X. Chen, L. S. Tan, Z. B. Wang, and L. P. Shi, Appl. Phys. Lett.. 89, 041108 (2006).
5. A. Manzke, C. Pfahler, O. Dubbers, A. Plettl, P. Ziemann, D. Crespy. E. Schreiber, U. Ziener, and K. Landfester, Adv. Mater., 19, 1337 (2007).
6. J. Bang, S.-H. Kim, E. Drockenmuller, M. J. Misner, T. P. Russell, and C. J. Hawker. J. Am. Chem. Soc., 128, 7622 (2006).
7. a) H. Yabu, M. Tanaka, K. Ijiro, and M. Shimomura, Langmuir, 19, 6297, (2003).
8. b) H. Yabu, M. Kojima, M. Tsubouchi, S. Onoue, M. Sugitani, and M. Shimomura, Colloids Surf., A, 284-285, 254 (2006).
9. H. Yabu and M. Shimomura, Langmuir, 22, 4992 (2006).