Synthesis and structure-property relations of a series of photochromic molecular classes for controlled and efficient formation of surface relief nanostructures

Advanced Functional Materials

Volumn 19, Issue 16, 2009, Pages 2630-2638

  Walker, Roland ^a   Audorff, Hubert ^a   Kador, Lothar ^a   Schmidt, Hans Werner ^a  

^a UNIVERSITY OF BAYREUTH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION PROPERTY; AFM; AMORPHOUS PHASE; AZOBENZENE MOIETY; AZOBENZENE SIDE GROUPS; COMPLEX SURFACE; ELEVATED TEMPERATURE; ESTER LINKAGES; GLASS TRANSITION TEMPERATURE; HOLOGRAPHIC MEASUREMENT; HOLOGRAPHIC TECHNIQUE; MOLECULAR CLASS; MOLECULAR GLASS; NEW SERIES; OPTICAL SUSCEPTIBILITY; REPLICA-MOLDING PROCESS; STRUCTURAL VARIATIONS; STRUCTURE PROPERTY RELATION; SURFACE PATTERN; SURFACE RELIEF GRATINGS; SURFACE RELIEFS; TEMPERATURE DEPENDENT; THERMOPLASTIC POLYMER; TRIPHENYL AMINES;

ESTERS; GLASS; GLASS TRANSITION; MOLECULAR DYNAMICS; OPTICAL CORRELATION; PHOTOCHROMISM; STRUCTURAL PROPERTIES; TEXTILE PRINTING;

SURFACE PROPERTIES;

EID: 70349251834     PISSN: 1616301X     EISSN: 16163028     Source Type: Journal    
DOI: 10.1002/adfm.200900140     Document Type: Article

References (48)

1. a) Y. Shirota, J. Mater. Chem. 2005, 15, 75.
2. b) P. Strohriegl, J. V. Crazulevicius, Adv. Mater. 2002, 14, 1439.
3. c) M. Thelakkat, C. Schmitz, C. Hohle, P. Strohriegl, H.-W. Schmidt, U. Hofmann, S. Schloter, D. Haarer, Phys. Chem. Chem. Phys. 1999, 1, 1693.
4. d) F. Steuber, J. Staudigel, M. Stössel, J. Simmerer, A. Winnacker, H. Spreitzer, F. Weissörtel, J. Salbeck, Adv. Mater. 2000, 12, 130.
5. a) R. H. Friend, R. W. Cymer, A. B. Holmes, J. H. Burroughes, R. N. Marks, C. Taliani, D. D.C. Bradley, D. A. Dos Santos, J. L. Bredas, M. Logdlund, W. R. Salaneck, Nature 1999, 397, 121.
6. b) S. Cuenes, H. Neugebauer, N. S. Sariciftci, Chem. Rev. 2007, 107, 1324.
7. c) M. T. Bernius, M. Inbasekaran, J. O'Brien, W. Wu, Adv. Mater. 2000, 12, 1737.
8. a) M. Haeckel, L. Kador, D. Kropp, H.-W. Schmidt, Adv. Mater. 2007, 19, 227.
9. b) M. Haeckel, L. Kador, D. Kropp, C. Frenz, H.-W. Schmidt, Adv. Funct. Mater. 2005, 15,1722.
10. c) R. Hagen, T. Bieringer, Adv. Mater. 2001, 13, 1805.
11. d) K. C. Yager, C. J. Barrett, J. Photochem. Photobiol. A 2006, 182, 250.
12. e) S. Schloter, U. Hofmann, P. Strohriegl, H. W. Schmidt, D. Haarer, J. Opt. Soc. Am. B 1998, 15, 2473.
13. A. Natansohn, P. Rochon, Chem. Rev. 2002, 102, 4139.
14. P. Rochon, E. Batalla, A. Natansohn, Appl. Phys. Lett. 1995, 66, 136.
15. D. Y. Kim, S. K. Tripathy, L. Li, J. Kumar, Appl. Phys. Lett. 1995, 66, 1166.
16. L. L. Carvalho,T. F. C. Borges, M. R.Cardoso, C. R. Mendonca, D.T. Balogh, Eur. Polym. J. 2006, 42, 2589.
17. B. M. Schulz, M. R. Huber, T. Bieringer, C. Krausch, S. J. Zilker, Synth. Met. 2001, 124, 155.
18. K. C. Yager, O. M. Tanchak, C. Godbout, H. Fritzsche, C. J. Barrett, Macromolecules 2006, 39, 9311.
19. C. Frenz, A. Fuchs, H.-W. Schmidt, U. Theissen, D. Haarer, Macromol. Chem. Phys. 2004, 205, 1246.
20. O. Kulikovska, L. M. Coldenberg, J. Stumpe, Chem. Mater. 2007, 19, 3343.
21. O. Kulikovska, L. M. Goldenberg, L. Kulikovsky, J. Stumpe, Chem. Mater. 2008, 20, 3528.
22. a) H. Nakano, T. Tanino, T. Takahashi, H. Ando, Y. Shirota, J. Mater. Chem. 2008, 18, 242.
23. b) E. Ishow, B. Lebon, Y. He, X. Wang, L. Bouteiller, L Calmiche, K. Nakatani, Chem. Mater. 2006, 14, 1261.
24. c) A. Perschke, T Fuhrmann, Adv. Mater. 2002, 14, 841.
25. d) A. Stracke, J. H. Wendorff, D. Coldmann, D. Janietz, B. Stiller, Adv. Mater. 2000, 12, 282.
26. e) C. Chun, M.-J. Kim, D. Vak, D. Y. Kim, J. Moter. Chem. 2003, 13, 2904.
27. f) H. Ando, T. Takahashi, H. Nakano, Y. Shirota, Chem. Lett. 2003, 32, 710.
28. M.-J. Kim, E.-M. Seo, D. Vak, D.-Y. Kim, Chem. Mater. 2003, 15, 4021.
29. E.-M. Seo, M. J. Kim, Y.-D. Shin, J.-S. Lee, D.-Y. Kim, Mol. Cryst. Liq. Cryst. 2001, 370, 143.
30. C. Chun, J. Chim, M.-J. Kim, D. Y. Kim, J. Polym. Sci, Part A: Polym. Chem. 2005, 43, 3525.
31. N. K. Viswanathan, D. Y. Kim, S. Bian, J. Williams, W. Liu, L. Li, L. Samuelson, J. Kumar, S. K. Tripathy, J. Mater. Chem. 1999, 9, 1941.
32. J. A. Delaire, K. Nakatani, Chem. Rev. 2000, 100, 1817.
33. P. Rochon, A. Natansohn, C. L. Callender, L. Robitaille, Appl. Phys. Lett. 1997, 71, 1008.
34. J. Kato, I. Yamaguchi, H. Tanaka, Opt. Lett. 1996, 21, 767.
35. O. Watanabe, M. Tsuchimori, A. Okada, H. Ito, Appl. Phys. Lett. 1997, 71, 750.
36. B. Liu, M. Wang, Y. He, X. Wang, Langmuir 2006, 22, 7405.
37. J. L. Wilbur, A. Kumar, E. Kim, C. M. Whitesides, Adv. Mater. 1994, 6, 600.
38. S. R. Quake, A. Scherer, Science 2000, 290, 1536.
39. J. Park, P. T Hammond, Adv. Mater. 2004, 16, 520.
40. R. I. Walter, J. Am. Chem. Soc. 1955, 77, 5999.
41. P. P. Birnbaum, J. H. Linford, D. W. C. Style, Trans. Faraday Soc. 1953, 49, 735.
42. A. BurawoyJ. Chem. Soc. 1937, 1865.
43. H. Audorff, R.Walker, L. Kador, H.-W. Schmidt,J. Phys. Chem. 6 2009, 113, 3379.
44. R. Magnusson, T. K. Caylord, J. Opt. Soc. Am. 1978, 68, 806.
45. J. Kumar, L. Li, X. L. Jiang, D. Y. Kim, T. S. Lee, S. Tripathy, Appl. Phys. Lett. 1998, 72, 2096.
46. K. Kreger, C. Loeffler, R. Walker, N. Wirth, D. Bingemann, H. Audorff, E. A. Roessler, L Kador, H.-W. Schmidt, Macromol. Chem. Phys. 2007, 208, 1530.
47. K. C. Yager, C. J. Barrett, J. Chem. Phys. 2004, 120, 1089.
48. S. Bauer-Gogonea, S. Bauer, W. Wirges, R. Gerhard-Multhaupt, J. Appl. Phys. 1994, 76, 2627.