Structural and photoelectrochemical properties of DC magnetron-sputtered TiO2 layers on FTO

Journal of Physical Chemistry C

Volumn 118, Issue 43, 2014, Pages 25234-25244

  Kruth, Angela ^a   Peglow, Sandra ^a   Quade, Antje ^a   Pohl, Marga Martina ^b   Foest, Rüdiger ^a   Brüser, Volker ^a   Weltmann, Klaus Dieter ^a  

^a LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

^b LEIBNIZ INSTITUT FÜR KATALYSE E V AN DER UNIVERSITÄT ROSTOCK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

NANOCOMPOSITES; PHOTOCATALYSIS; REACTIVE SPUTTERING; TIN OXIDES; ULTRAVIOLET VISIBLE SPECTROSCOPY;

FLUORINE DOPED TIN OXIDE; LARGE-SCALE PRODUCTION; NANO-CRYSTALLINE TIO; PHOTOCATALYTIC PROPERTY; PHOTOELECTROCHEMICAL PROPERTIES; POST DEPOSITION ANNEALING; REACTIVE SPUTTERING PROCESS; SEMICONDUCTOR ELECTRODE;

TITANIUM DIOXIDE;

EID: 84949117346     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp507487c     Document Type: Article

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