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International Journal of Electrochemical Science

Volumn 8, Issue 1, 2013, Pages 1487-1500

Effect of the deposition temperature on the corrosion stability of TiO2 films prepared by metal organic chemical vapor deposition

(3) Antunes, R A a de Oliveira, M C L b Pillis, M F c

a UNIVERSIDADE FEDERAL DO ABC (Brazil)

b Entrepreneurship and Innovation Center (CIETEC) (Brazil)

c INSTITUTO DE PESQUISAS ENERGÉTICAS E NUCLEARES (Brazil)

Author keywords

Corrosion; Deposition temperature; MOCVD; TiO2 films

Indexed keywords

EID: 84873801439 PISSN: None EISSN: 14523981 Source Type: Journal
DOI: None Document Type: Article

Times cited : (30)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.