Interface control in the chemical vapor deposition of titanium dioxide on silicon(100)

Thin Solid Films

Volumn 377-378, Issue , 2000, Pages 766-771

  Tuan, Allan ^a   Yoon, Meeyoung ^a   Medvedev, Valentin ^a   Ono, Yoshi ^b   Ma, Yanjun ^b   Rogers Jr , J W ^c  

^a Box 351750 ^*  (United States)

^b SHARP LABORATORIES OF AMERICA   (United States)

^c PACIFIC NORTHWEST NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; INTERFACES (MATERIALS); METALLORGANIC CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; THIN FILMS; TITANIUM DIOXIDE; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS;

STRANSKI-KRASTANOV MODES; TITANIUM TETRAKIS ISOPROPOXIDE;

OPTICAL FILMS;

EID: 18844464503     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01453-X     Document Type: Article

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