Block copolymer self assembly for design and vapor-phase synthesis of nanostructured antireflective surfaces

Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics

Volumn 32, Issue 6, 2014, Pages

  Rahman, Atikur ^a   Liu, Mingzhao ^a   Black, Charles T ^a  

^a BROOKHAVEN NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERS; MOLECULAR WEIGHT; PHYSICAL VAPOR DEPOSITION; PLASMONS; SELF ASSEMBLY; SEMICONDUCTOR GROWTH; SILVER; SURFACE PLASMON RESONANCE; SURFACE TOPOGRAPHY; SYNTHESIS (CHEMICAL); VAPOR PHASE EPITAXY;

ANTIREFLECTIVE SURFACES; BLOCK COPOLYMER SELF-ASSEMBLY; CONTROL OF PARTICLE SHAPE; COPOLYMER MOLECULAR WEIGHT; LOCALIZED SURFACE PLASMON; SILVER NANOPARTICLES; THIN-FILM COATINGS; VAPOR PHASE SYNTHESIS;

BLOCK COPOLYMERS;

EID: 84949115688     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.4896335     Document Type: Article

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