Hybrid Metal-Semiconductor Nanostructure for Ultrahigh Optical Absorption and Low Electrical Resistance at Optoelectronic Interfaces

ACS Nano

Volumn 9, Issue 11, 2015, Pages 10590-10597

  Narasimhan, Vijay K ^a   Hymel, Thomas M ^a   Lai, Ruby A ^b   Cui, Yi ^a,c  

^a Stanford University   (United States)

^b STANFORD UNIVERSITY   (United States)

^c SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

Author keywords

light trapping; metal nanowire networks; metal assisted chemical etching; Mie resonators; photon management; transparent conductors

Indexed keywords

ELECTROMAGNETIC WAVE ABSORPTION; ETCHING; LIGHT ABSORPTION; METALS; NANOSTRUCTURES; PHOTONS; SILICON; SILICON NITRIDE; SILICON WAFERS;

LIGHT-TRAPPING; METAL NANOWIRE; METAL-ASSISTED CHEMICAL ETCHING; PHOTON MANAGEMENT; TRANSPARENT CONDUCTORS;

SHEET METAL;

EID: 84948405814     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/acsnano.5b04034     Document Type: Article

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