Protection of Si photocathode using TiO2 deposited by high power impulse magnetron sputtering for H2 evolution in alkaline media

Solar Energy Materials and Solar Cells

Volumn 144, Issue , 2016, Pages 758-765

  Bae, Dowon ^a   Shayestehaminzadeh, Seyedmohammad ^b,c   Thorsteinsson, Einar B ^b   Pedersen, Thomas ^a   Hansen, Ole ^a   Seger, Brian ^a   Vesborg, Peter C K ^a   Ólafsson, Sveinn ^b   Chorkendorff, Ib ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

^b UNIVERSITY OF ICELAND   (Iceland)

^c RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

High power impulse magnetron sputtering; Hydrogen evolution; Photocatalysis; Titanium dioxide

Indexed keywords

ALKALINITY; CHEMICAL STABILITY; ELECTROCHEMISTRY; ELECTROLYTES; HYDROGEN PRODUCTION; PHOTOCATALYSIS; PHOTOCATHODES; PHOTOELECTROCHEMICAL CELLS; SILICON; SPUTTERING; THIN FILMS; TITANIUM DIOXIDE;

ABSORBER MATERIAL; ALKALINE ELECTROLYTES; ALKALINE SOLUTIONS; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HYDROGEN EVOLUTION; PHOTOELECTROCHEMICALS; PROTECTION LAYERS; X-RAY REFLECTOMETRY;

MAGNETRON SPUTTERING;

EID: 84946595032     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.solmat.2015.10.020     Document Type: Article

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