Efficient and sustained photoelectrochemical water oxidation by cobalt oxide/silicon photoanodes with nanotextured interfaces

Journal of the American Chemical Society

Volumn 136, Issue 17, 2014, Pages 6191-6194

  Yang, Jinhui ^a   Walczak, Karl ^a   Anzenberg, Eitan ^a   Toma, Francesca M ^a   Yuan, Guangbi ^a   Beeman, Jeffrey ^a   Schwartzberg, Adam ^a   Lin, Yongjing ^a,b   Hettick, Mark ^a,b   Javey, Ali ^a,b   Ager, Joel W ^a,b   Yano, Junko ^a   Frei, Heinz ^a   Sharp, Ian D ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COBALT; OXIDATION; SILICON; SILICON OXIDES;

INTERFACIAL CONTACT; LIGHT ABSORBERS; PHOTO-ELECTRODES; PHOTOCURRENT DENSITY; PHOTOELECTROCHEMICAL WATER OXIDATION; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; SATURATION CURRENT DENSITIES; SOLAR ILLUMINATION;

ELECTROCHEMISTRY;

COBALT DERIVATIVE; OXIDE; SILICON; WATER; COBALT; COBALT OXIDE; NANOMATERIAL;

ARTICLE; CATALYST; CHEMICAL ENGINEERING; CORROSION; ELECTROCHEMICAL ANALYSIS; NANOCHEMISTRY; OXIDATION; PHOTOCHEMISTRY; SEMICONDUCTOR; CATALYSIS; CHEMISTRY; ELECTRODE; OXIDATION REDUCTION REACTION;

CATALYSIS; COBALT; ELECTRODES; NANOSTRUCTURES; OXIDATION-REDUCTION; OXIDES; PHOTOCHEMICAL PROCESSES; SILICON; WATER;

EID: 84899717861     PISSN: 00027863     EISSN: 15205126     Source Type: Journal    
DOI: 10.1021/ja501513t     Document Type: Article

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