Metal-free plasma-enhanced chemical vapor deposition of large area nanocrystalline graphene

Materials Research Express

Volumn 1, Issue 2, 2014, Pages

  Schmidt, Marek E ^a   Xu, Cigang ^b   Cooke, Mike ^b   Mizuta, Hiroshi ^a,c   Chong, Harold M H ^c  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b OXFORD INSTRUMENTS PLASMA TECHNOLOGY   (United Kingdom)

^c UNIVERSITY OF SOUTHAMPTON   (United Kingdom)

Author keywords

Nanocrystalline graphene; PECVD; Wafer scale

Indexed keywords

GRAPHENE; NANOCRYSTALLINE SILICON; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLATE METAL; SAPPHIRE; SILICON WAFERS; SUBSTRATES;

NANOCRYSTALLINES; NON-UNIFORMITIES; OPTICAL TRANSPARENCY; PARALLEL PLATES; SAPPHIRE SUBSTRATES; SILICON SUBSTRATES; THERMALLY OXIDIZED; WAFER SCALE;

NANOCRYSTALS;

EID: 84946130673     PISSN: None     EISSN: 20531591     Source Type: Journal    
DOI: 10.1088/2053-1591/1/2/025031     Document Type: Article

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