Flow structure and heat transfer in a stagnation flow CVD reactor

Journal of Heat Transfer

Volumn 133, Issue 8, 2011, Pages 1-6

  Memon, Nasir ^a   Jaluria, Yogesh ^a  

^a RUTGERS UNIVERSITY   (United States)

Author keywords

Buoyancy effects; Chemical vapor deposition; CVD; Stagnation flow

Indexed keywords

EID: 84943601803     PISSN: 00221481     EISSN: 15288943     Source Type: Journal    
DOI: 10.1115/1.4003749     Document Type: Article

References (17)

1. Hintermann, H. E., 1996, “Advances and Development in CVD Technology,” Mater. Sci. Eng., A, 209(1-2), pp. 366-371.
2. Fotiadis, D. I., Kremer, A. M., and McKenna, D. R., 1987, “Complex Flow Phenomena in Vertical MOCVD Reactors: Effects on Deposition Uniformity and Interface Abruptness,” J. Cryst. Growth, 85, pp. 154-164.
3. Fotiadis, D. I., Boekholt, M., and Jensen, K. F., 1990, “Flow and HeatTransfer in CVD Reactors: Comparison of Raman Temperature Measurements and Finite Element Model Predictions,” J. Cryst. Growth, 100, pp. 577-599.
4. Chiu, W. K. S., and Jaluria, Y., 1999, “Effect of Buoyancy, Susceptor Motion, and Conjugate Transport in Chemical Vapor Deposition Systems,” ASME J. Heat Transfer, 121(3), pp. 757-761.
5. Mahajan, R. L., 1996, “Transport Phenomena in Chemical Vapor-Deposition Systems,” Adv. Heat Transfer, 28, pp. 339-425.
6. Vanka, S. P., Luo, G., and Glumac, N. G., 2004, “Numerical Study of Mixed Convection Flow in an Impinging Jet CVD Reactor for Atmospheric Pressure Deposition of Thin Films,” ASME J. Heat Transfer, 126(5), pp. 764-775.
7. Luo, G., Vanka, S. P., and Glumac, N., 2004, “Fluid Flow and Transport Processes in a Large Area Atmospheric Pressure Stagnation Flow CVD Reactor for Deposition of Thin Films,” Int. J. Heat Mass Transfer, 47(23), pp. 4979-4994.
8. Lin, P. T., Jaluria, Y., and Gea, H. C., 2009, “Parametric Modeling and Optimization of Chemical Vapor Deposition Process,” ASME J. Manuf. Sci. Eng., 131, p. 011011.
9. Cho, W. K., Choi, D. H., and Kim, M., 1999, “Optimization of the Inlet Velocity Profile for Uniform Epitaxial Growth in a Vertical Metalorganic Chemical Vapor Deposition Reactor,” Int. J. Heat Mass Transfer, 42(22), pp. 4143-4152.
10. Chiu, W. K. S., Richards, C. J., and Jaluria, Y., 2000, “Flow Structure and Heat Transfer in a Horizontal Converging Channel Heated From Below,” Phys. Fluids, 12, p. 2128.
11. Mathews, A. G., and Peterson, J. E., 2002, “Flow Visualizations and Transient Temperature Measurements in an Axisymmetric Impinging Jet Rapid Thermal Chemical Vapor Deposition Reactor,” ASME J. Heat Transfer, 124(3), pp. 564-570.
12. Wang, C. A., Groves, S. H., and Palmateer, S. C., 1986, “Flow Visualization Studies for Optimization of OMVPE Reactor Design,” J. Cryst. Growth, 77(1-3), pp. 136-143.
13. Gadgil, P. N., 1993, “Optimization of a Stagnation Point Flow Reactor Design for Metalorganic Chemical Vapor Deposition by Flow Visualization,” J. Cryst. Growth, 134(3-4), pp. 302-312.
14. Gadgil, P. N., 1993, “Single Wafer Processing in Stagnation Point Flow CVD Reactor: Prospects, Constraints and Reactor Design,” J. Electron. Mater., 22(2), pp. 171-177.
15. Dandy, D. S., and Yun, J., 1997, “Momentum and Thermal Boundary-Layer Thickness in a Stagnation Flow Chemical Vapor Deposition Reactor,” J. Mater. Res., 12(4), pp. 1112-1121.
16. Joye, D. D., 1996, “Design Criterion for the Heat-Transfer Coefficient in Opposing Flow, Mixed Convection Heat Transfer in a Vertical Tube,” Ind. Eng. Chem. Res., 35(7), pp. 2399-2403.
17. Zhou, D. W., and Lee, S., 2007, “Forced Convective Heat Transfer With Impinging Rectangular Jets,” Int. J. Heat Mass Transfer, 50(9-10), pp. 1916-1926.