Parametric modeling and optimization of chemical vapor deposition process

Journal of Manufacturing Science and Engineering

Volumn 131, Issue 1, 2009, Pages 0110111-0110117

  Lin, Po Ting ^a   Jaluria, Yogesh ^a   Gea, Hae Chang ^a  

^a RUTGERS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION RATES; THIN FILMS;

ADDITIONAL SAMPLING; CHEMICAL VAPOR DEPOSITION PROCESS; CHEMICAL VAPOR DEPOSITIONS (CVD); OPTIMIZATION FORMULATIONS; PARAMETRIC MODELING; PARAMETRIC MODELS; RADIAL BASIS FUNCTIONS; VARIOUS FUNCTIONS;

CHEMICAL VAPOR DEPOSITION;

EID: 77953736411     PISSN: 10871357     EISSN: 15288935     Source Type: Journal    
DOI: 10.1115/1.3063689     Document Type: Article

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