Momentum and thermal boundary-layer thickness in a stagnation flow chemical vapor deposition reactor

Journal of Materials Research

Volumn 12, Issue 4, 1997, Pages 1112-1121

  Dandy, David S ^a   Yun, Jungheum ^a  

^a Engineering Research Center and Hydraulics Laboratory   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPROXIMATION THEORY; BOUNDARY LAYERS; CHEMICAL VAPOR DEPOSITION; EQUATIONS OF MOTION; FILM GROWTH; LAMINAR FLOW; PRANDTL NUMBER; REYNOLDS NUMBER; SYNTHETIC DIAMONDS; THERMODYNAMICS;

LEWIS NUMBER; PECLET NUMBER; THERMAL BOUNDARY LAYERS;

CHEMICAL REACTORS;

EID: 0031124962     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1997.0154     Document Type: Article

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