Ultraclean and large-area monolayer hexagonal boron nitride on Cu foil using chemical vapor deposition

Nanotechnology

Volumn 26, Issue 27, 2015, Pages

  Wen, Yao ^a   Shang, Xunzhong ^b   Dong, Ji ^a   Xu, Kai ^a   He, Jun ^a   Jiang, Chao ^a  

^a NATIONAL CENTER FOR NANOSCIENCE AND TECHNOLOGY   (China)

^b HUBEI UNIVERSITY   (China)

Author keywords

copper foil; hexagonal boron nitride; highly crystalline; large area; monolayer; ultraclean

Indexed keywords

ATOMIC FORCE MICROSCOPY; BORON NITRIDE; COPPER; CRYSTALLINE MATERIALS; DEPOSITION; DIELECTRIC MATERIALS; METAL CLADDING; NITRIDES; OPTOELECTRONIC DEVICES; VAN DER WAALS FORCES;

COPPER FOILS; HEXAGONAL BORON NITRIDE; HEXAGONAL BORON NITRIDE (H-BN); LARGE-AREA; ROOT MEAN SQUARE ROUGHNESS; SELECTIVE AREA ELECTRON DIFFRACTION; TWO DIMENSIONAL (2 D); ULTRACLEAN;

MONOLAYERS;

EID: 84935013446     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/26/27/275601     Document Type: Article

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