Integer versus fractional charge transfer at metal(/insulator)/organic interfaces: Cu(/NaCl)/TCNE

ACS Nano

Volumn 9, Issue 5, 2015, Pages 5391-5404

  Hofmann, Oliver T ^a,b   Rinke, Patrick ^a,c   Scheffler, Matthias ^a   Heimel, Georg ^d  

^a FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^b GRAZ UNIVERSITY OF TECHNOLOGY   (Austria)

^c AALTO UNIVERSITY   (Finland)

^d HUMBOLDT UNIVERSITY   (Germany)

Author keywords

alkali halides; charge localization; copper; coverage dependence; density functional theory; growth; integer charge transfer; TCNE; work function

Indexed keywords

ADSORBATES; ALKALI HALIDES; CHARGE TRANSFER; COPPER; ELECTRONIC STRUCTURE; GROWTH (MATERIALS); INTERFACES (MATERIALS); WORK FUNCTION;

CHARGE LOCALIZATION; COVERAGE DEPENDENCE; ENERGY LEVEL ALIGNMENT; HYBRID DENSITY FUNCTIONAL THEORY; INDIVIDUAL COMPONENTS; MOLECULAR GEOMETRIES; TCNE; TRANSLATIONAL SYMMETRY;

DENSITY FUNCTIONAL THEORY;

EID: 84930635130     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/acsnano.5b01164     Document Type: Article

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