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Volumn 4, Issue 5, 2015, Pages 516-520

Writing highly ordered macroscopic patterns in cylindrical block polymer thin films via raster solvent vapor annealing and soft shear

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[No Author keywords available]

Indexed keywords


EID: 84929615992     PISSN: None     EISSN: 21611653     Source Type: Journal    
DOI: 10.1021/acsmacrolett.5b00126     Document Type: Article
Times cited : (31)

References (35)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.