Analytical model of atmospheric pressure, helium/trace gas radio-frequency capacitive Penning discharges

Plasma Sources Science and Technology

Volumn 24, Issue 2, 2015, Pages

  Lieberman, M A ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

atmospheric pressure discharge model; helium discharge model; Penning discharge model

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; DENSITY OF GASES; ELECTRON TEMPERATURE; ELECTRONS; HELIUM; HOT ELECTRONS; IMPACT IONIZATION; IONIZATION; IONS; POSITIVE IONS; RADIO WAVES;

ATMOSPHERIC PRESSURE DISCHARGE; CAPACITIVE DISCHARGES; DISCHARGE PARAMETERS; ELECTRON MULTIPLICATION; EQUILIBRIUM SOLUTIONS; HELIUM DISCHARGE; HYBRID CALCULATIONS; PENNING DISCHARGE;

IONIZATION OF GASES;

EID: 84924285133     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/24/2/025009     Document Type: Article

References (49)

1. Knake N, Reuter S, Niemi K, Schulz-von der Gathen V and Winter J 2008 J. Phys. D: Appl. Phys. 41 194006
2. Schulz-von der Gathen V, Schaper L, Knake N, Reuter S, Niemi K, Gans T and Winter J 2008 J. Phys. D: Appl. Phys. 41 194004
3. Ellerweg D, Benedikt J, von Keudell A, Knake N and Schulz-von der Gathen V 2010 New J. Phys. 12 013021
4. Bibinov N, Knake N, Bahre H, Awakowicz P and Schulz-von der Gathen V 2011 J. Phys. D: Appl. Phys. 44 345204
5. Shi J J, Liu D W and Kong M G 2007 IEEE Trans. Plasma Sci. 35 137
6. Zhang J, Ding K, Wei K, Zhang J and Shi J 2009 Phys. Plasmas 16 090702
7. Liu D W, Iza F and Kong M G 2009 Plasma Process. Polym. 6 446
8. Li S, Wu Q, Zhang J, Wang D and Uhm H 2010 Phys. Plasmas 17 063506
9. Huai Y, Li S, Li H, Wu K, Zhang J, Wang S and Wang Y 2014 IEEE Trans. Plasma Sci. 42 1648
10. Park G, Lee H, Kim G and Lee J K 2008 Plasma Process. Polym. 5 569
11. Park G, Hong Y, Lee H, Sim J and Lee J K 2010 Plasma Process. Polym. 7 281
12. Liu D X, Bruggeman P, Iza F, Rong M Z and Kong M G 2010 Plasma Sources Sci. Technol. 19 025018
13. Murakami T, Niemi K, Gans T, O'Connell D and Graham G 2013 Plasma Sources Sci. Technol. 22 015003
14. Stafford D S and Kushner M J 2004 J. Appl. Phys. 96 2451
15. Iza F, Lee J K and Kong M G 2007 Phys. Rev. Lett. 99 075004
16. Liu D W, Iza F and Kong M G 2008 Appl. Phys. Lett. 93 261503
17. Martens T, Bogaerts A, Brok W J M and Dijk P V 2008 Appl. Phys. Lett. 92 041504
18. Hong Y J, Moon M, Iza F, Kim G C and Lee J K 2008 J. Phys. D: Appl. Phys. 41 245208
19. Waskoenig J 2010 Numerical simulations of the electron dynamics in single, dual radio-frequency driven atmospheric pressure plasmas, associated plasma chemistry in electro-negative He-O2 mixtures PhD Thesis Queen's University Belfast
20. Waskoenig J, Niemi K, Knake N, Graham L M, Reuter S, Schulz-von der Gathen V and Gans T 2010 Plasma Sources Sci. Technol. 19 045018
21. Hemke T, Eremin D, Mussenbrock T, Derzsi A, Donko Z, Dittmann K, Meichsner J and Schulze J 2013 Plasma Sources Sci. Technol. 22 015012
22. Lazzaroni C, Chabert P, Lieberman M A, Lichtenberg A J and Leblanc A 2012 Plasma Sources Sci. Technol. 21 035013
23. Lazzaroni C, Lieberman M A, Lichtenberg A J and Chabert P 2012 J. Phys. D: Appl. Phys. 45 495204
24. Kawamura E, Lieberman M A, Lichtenberg A J, Chabert P and Lazzaroni C 2014 Plasma Sources Sci. Technol. 23 035014
25. Ding K, Lieberman M A and Lichtenberg A J 2014 J. Phys. D: Appl. Phys. 47 305203
26. Ding K, Lieberman M A and Lichtenberg A J 2014 Plasma Sources Sci. Technol. 23 065048
27. Godyak V A and Khanneh A S 1986 IEEE Trans. Plasma Sci. 14 112
28. Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (New York: Wiley)
29. Chabert P and Braithwaite N 2011 Physics of Radiofrequency Plasmas (Cambridge: Cambridge University Press)
30. Makabe T and Petrovic Z L 2006 Plasma Electronics: Applications in Microelectronic Device Fabrication (London: Taylor and Francis)
31. Hagelaar G J M and Pitchford L C 2005 Plasma Sources Sci. Technol. 14 722
32. Morgan database www.lxcat.net, retrieved for He/N2 on 17 September 2013
33. Morgan database, www.lxcat.net, retrieved for He/H2O on 17 December 2013
34. Raizer Y P 1991 Gas Discharge Physics (Berlin: Springer)
35. Pouvesle J M, Bouchoule A and Stevefelt J 1982 J. Chem. Phys. 77 817
36. Kossyi I A, Kostinsky A Y, Matveyev A A and Silakov V P 1992 Plasma Sources Sci. Technol. 1 207
37. Sommerer T and Kushner M J 1992 J. Appl. Phys. 71 1661
38. Rauf S and Kushner M J 1999 J. Appl. Phys. 85 3460
39. Deloche R, Monchicourt P, Cheret M and Lambert F 1976 Phys. Rev. A 13 1140
40. Gordillo F J 2008 J. Phys. D: Appl. Phys. 41 234016
41. Konstantinovskii R S, Maiorov V M and Shibkova L V 2005 Kinet. Catal. 46 775
42. Golubovskii Y B, Maiorov V A, Behnke J and Behnke J F 2003 J. Phys. D: Appl. Phys. 36 39
43. Stalder K R, Vidmar R J, Nersisyan G and Graham W G 2006 J. Appl. Phys. 99 093301
44. Yuan X and Raja L L 2003 IEEE Trans. Plasma Sci. 31 495
45. Wang Q, Economou D J and Donnelly V M 2006 J. Appl. Phys. 100 023301
46. Petrov G M et al 2000 Plasma. Chem. Plasma Process. 20 183
47. Miller T J, Farquhar P R and Willacy k 1997 Astrom. Astrophys. Suppl. Ser. 121 139
48. Fuller E N, Schettler P D and Giddings J C 1966 Indust. Eng. Chem. 58 19
49. Ellis H W, Pai R Y, McDaniel E W, Mason E A and Viehland L A 1976 At. Data Nucl. Data Tables 17 177