Global model of He/O2 and Ar/O2 atmospheric pressure glow discharges

Plasma Processes and Polymers

Volumn 5, Issue 6, 2008, Pages 569-576

  Park, Ganyoung ^a   Lee, Hyunwoo ^a   Kim, Gyoocheon ^b   Lee, Jae Koo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

^b Pusan National University   (South Korea)

Author keywords

Atmospheric pressure glow discharge (APGD); Atomic oxygen; Computer modeling; Density; Global model; Reactive oxygen species (ROS)

Indexed keywords

ARGON; ATMOSPHERIC PRESSURE; ATMOSPHERICS; ATOMIC PHYSICS; ATOMS; CLIMATOLOGY; COMPUTER SYSTEMS; DISCHARGE (FLUID MECHANICS); ELECTRIC DISCHARGES; ELECTRON TEMPERATURE; GLOW DISCHARGES; HELIUM; INERT GASES; METEOROLOGY; NONMETALS; ORGANIC POLYMERS; OXYGEN; OZONE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRESSURE; RADIOACTIVITY; STERILIZATION (CLEANING); SURFACE DISCHARGES; SURFACE TREATMENT; VACUUM APPLICATIONS; VACUUM DEPOSITION;

ATMOSPHERIC PRESSURE GLOW DISCHARGE (APGD); ATOMIC OXYGEN; COMPUTER MODELING; DENSITY; GLOBAL MODEL; REACTIVE OXYGEN SPECIES (ROS);

ELECTRONS;

EID: 54149098367     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200800019     Document Type: Article

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