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Volumn 87, Issue 5, 2015, Pages 2907-2915

Accurate and precise measurement of oxygen isotopic fractions and diffusion profiles by selective attenuation of secondary ions (SASI)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS; DEPTH PROFILING; DIFFUSION; GRAIN BOUNDARIES; ION EXCHANGE; ISOTOPES; MASS SPECTROMETRY; MATERIALS PROPERTIES; ORGANIC POLYMERS; OXYGEN; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY;

EID: 84923870558     PISSN: 00032700     EISSN: 15206882     Source Type: Journal    
DOI: 10.1021/ac504409x     Document Type: Article
Times cited : (13)

References (45)
  • 35
    • 84923893774 scopus 로고    scopus 로고
    • U.S. Patent No. US 8785844B8785842.
    • Niehuis, E. U.S. Patent No. US 8785844B8785842, 2014.
    • (2014)
    • Niehuis, E.1
  • 36
    • 84923893773 scopus 로고    scopus 로고
    • IonToF. technical information. Münster, Germany.
    • IonToF. ToF-SIMS V technical information. Münster, Germany, 2014.
    • (2014) ToF-SIMS v


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.