Thermal stability of functional P(S-r-MMA) random copolymers for nanolithographic applications

ACS Applied Materials and Interfaces

Volumn 7, Issue 7, 2015, Pages 3920-3930

  Sparnacci, Katia ^a   Antonioli, Diego ^a   Gianotti, Valentina ^a   Laus, Michele ^a   Zuccheri, Giampaolo ^b   Ferrarese Lupi, Federico ^c   Giammaria, Tommaso Jacopo ^c   Seguini, Gabriele ^c   Ceresoli, Monica ^c,d   Perego, Michele ^c  

^a UNIVERSITY OF EASTERN PIEDMONT   (Italy)

^b CNR   (Italy)

^c LABORATORIO MDM   (Italy)

^d UNIVERSITY OF MILAN   (Italy)

Author keywords

P(S r MMA); PS b PMMA; rapid thermal processing; self assembly; thermal stability

Indexed keywords

ATOM TRANSFER RADICAL POLYMERIZATION; FREE RADICAL REACTIONS; GRAFTING (CHEMICAL); MONOMERS; PROCESSING; RAPID THERMAL PROCESSING; SELF ASSEMBLY; THERMODYNAMIC STABILITY;

ELECTRON TRANSFER; HIGH TEMPERATURE THERMAL TREATMENTS; LOW-TEMPERATURE EVOLUTION; LOWER TEMPERATURES; PERPENDICULAR ORIENTATION; PROCESSING TEMPERATURE; SELF-ORGANIZATION PROCESS; SURFACE CHARACTERISTICS;

TEMPERATURE;

EID: 84923796557     PISSN: 19448244     EISSN: 19448252     Source Type: Journal    
DOI: 10.1021/am509088s     Document Type: Article

References (47)

1. Li, M.; Ober, C. K. Block Copolymer Patterns and Templates Mater. Today 2006, 9, 30-39
2. Darling, S. B. Directing the Self-Assembly of Block Copolymers Prog. Polym. Sci. 2007, 32, 1152-1204
3. Hamley, I. W. Ordering in Thin Films of Block Copolymers: Fundamentals to Potential Applications Prog. Polym. Sci. 2009, 34, 1161-1210
4. Kim, H. C.; Park, S. M.; Hinsberg, W. D. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics Chem. Rev. 2010, 110, 146-177
5. Bates, C. M.; Maher, M. J.; Janes, D. W.; Ellison, C. J.; Willson, C. G. Block Copolymer Lithography Macromolecules 2014, 47, 2-12
6. Kim, S. O.; Solak, H. H.; Stoykovich, M. P.; Ferrier, N. J.; de Pablo, J. J.; Nealey, P. F. Epitaxial Self-Assembly of Block Copolymers on Lithographically Defined Nanopatterned Substrates Nature 2003, 424, 411-414
7. Fasolka, M. J.; Banerjee, P.; Mayes, A. M.; Pickett, G.; Balazs, A. C. Morphology of Ultrathin Supported Diblock Copolymer Films: Theory and Experiment Macromolecules 2000, 33, 5702-5712
8. Peters, R. D.; Yang, X. M.; Kim, T. K.; Sohn, B. H.; Nealey, P. F. Using Self-Assembled Monolayers Exposed to X-Rays to Control the Wetting Behavior of Thin Films of Diblock Copolymers Langmuir 2000, 16, 4625-4631
9. Peters, R. D.; Yang, X. M.; Kim, T. K.; Nealey, P. F. Wetting Behavior of Block Copolymers on Self-Assembled Films of Alkylchlorosiloxanes: Effect of Grafting Density Langmuir 2000, 16, 9620-9626
10. Borah, D.; Ozmen, M.; Rasappa, S.; Shaw, M. T.; Holmes, J. D.; Morris, M. Molecularly Functionalized Silicon Substrates for Orientation Control of the Microphase Separation of PS-b-PMMA and PS-b-PDMS Block Copolymer Systems Langmuir 2013, 29, 2809-20
11. Mansky, P.; Liu, Y.; Huang, E.; Russell, T. P.; Hawker, C. Controlling Polymer-Surface Interactions with Random Copolymer Brushes Science 1997, 275, 1458-1460
12. Ryu, D. Y.; Shin, K.; Drockenmuller, E.; Hawker, C. J.; Russell, T. P. A Generalized Approach to the Modification of Solid Surfaces Science 2005, 308, 236-239
13. Shengxiang, J.; Liu, G.; Zheng, F.; Craig, G. S. W.; Himpsel, F. J.; Nealey, P. F. Preparation of Neutral Wetting Brushes for Block Copolymer Films from Homopolymer Blends Adv. Mater. 2008, 20, 3054-3060
14. Bates, C. M.; Strahan, J. R.; Santos, L. J.; Mueller, B. K.; Bamgbade, B. O.; Lee, J. a; Katzenstein, J. M.; Ellison, C. J.; Willson, C. G. Polymeric Cross-Linked Surface Treatments for Controlling Block Copolymer Orientation in Thin Films Langmuir 2011, 27, 2000-2006
15. Jung, H.; Leibfarth, F. a.; Woo, S.; Lee, S.; Kang, M.; Moon, B.; Hawker, C. J.; Bang, J. Efficient Surface Neutralization and Enhanced Substrate Adhesion through Ketene Mediated Crosslinking and Functionalization Adv. Funct. Mater. 2013, 23, 1597-1602
16. Bang, J.; Bae, J.; Löwenhielm, P.; Spiessberger, C.; Given-Beck, S. A.; Russell, T. P.; Hawker, C. J. Facile Routes to Patterned Surface Neutralization Layers for Block Copolymer Lithography Adv. Mater. 2007, 19, 4552-4557
17. In, I.; La, Y.-H.; Park, S.-M.; Nealey, P. F.; Gopalan, P. Side-Chain-Grafted Random Copolymer Brushes as Neutral Surfaces for Controlling the Orientation of Block Copolymer Microdomains in Thin Films Langmuir 2006, 22, 7855-60
18. Han, E.; Gopalan, P. Cross-Linked Random Copolymer Mats as Ultrathin Nonpreferential Layers for Block Copolymer Self-Assembly Langmuir 2010, 26, 1311-1315
19. Seguini, G.; Giammaria, T. J.; Ferrarese Lupi, F.; Sparnacci, K.; Antonioli, D.; Gianotti, V.; Vita, F.; Placentino, I. F.; Hilhorst, J.; Ferrero, C.; Francescangeli, O.; Laus, M.; Perego, M. Thermally Induced Self-Assembly of Cylindrical Nanodomains in Low Molecular Weight PS-b-PMMA Thin Films Nanotechnology 2014, 25, 045301
20. Ferrarese Lupi, F.; Giammaria, T. J.; Seguini, G.; Vita, F.; Francescangeli, O.; Sparnacci, K.; Antonioli, D.; Gianotti, V.; Laus, M.; Perego, M. Fine Tuning of Lithographic Masks through Thin Films of PS-b-PMMA with Different Molar Mass by Rapid Thermal Processing ACS Appl. Mater. Interfaces 2014, 6, 7180-7188
21. Ham, S.; Shin, C.; Kim, E.; Ryu, D. Y.; Jeong, U.; Russell, T. P.; Hawker, C. J. Microdomain Orientation of PS- b -PMMA by Controlled Interfacial Interactions Macromolecules 2008, 41, 6431-6437
22. Han, E.; Stuen, K. O.; La, Y. H.; Nealey, P. F.; Gopalan, P. Effect of Composition of Substrate-Modifying Random Copolymers on the Orientation of Symmetric and Asymmetric Diblock Copolymer Domains Macromolecules 2008, 41, 9090-9097
23. Han, E.; Stuen, K. O.; Leolukman, M.; Liu, C. C.; Nealey, P. F.; Gopalan, P. Perpendicular Orientation of Domains in Cylinder-Forming Block Copolymer Thick Films by Controlled Interfacial Interactions Macromolecules 2009, 42, 4896-4901
24. Ballard, C. C.; Broge, E. C.; Iler, R. K.; St John, D. S.; McWhorter, J. R. Esterification of the Surface of Amorphous Silica J. Phys. Chem. 1961, 65, 20-25
25. Dion, M.; Rapp, M.; Rorrer, N.; Shin, D. H.; Martin, S. M.; Ducker, W. A. The Formation of Hydrophobic Films on Silica with Alcohols Colloids Surf., A 2010, 362, 65-70
26. Liu, C.-C.; Thode, C. J.; Rincon Delgadillo, P. A.; Craig, G. S. W.; Nealey, P. F.; Gronheid, R. Towards an All-Track 300 mm Process for Directed Self-assembly J. Vac. Sci. Technol., B: Microelectron. Process. Phenom. 2011, 29, 06F203
27. Ferrarese Lupi, F.; Giammaria, T. J.; Seguini, G.; Ceresoli, M.; Perego, M.; Antonioli, D.; Gianotti, V.; Sparnacci, K.; Laus, M. Flash Grafting of Functional Random Copolymers for Surface Neutralization J. Mater. Chem. C 2014, 2, 4909
28. Metwalli, E.; Perlich, J.; Wang, W.; Diethert, A.; Roth, S. V.; Papadakis, C. M.; Müller-Buschbaum, P. Morphology of Semicrystalline Diblock Copolymer Thin Films upon Directional Solvent Vapor Flow Macromol. Chem. Phys. 2010, 211, 2102-2108
29. Sinturel, C.; Vayer, M.; Morris, M.; Hillmyer, M. Solvent Vapor Annealing of Block Polymer Thin Films Macromolecules 2013, 46, 5399-5415
30. Ferrarese Lupi, F.; Giammaria, T. J.; Ceresoli, M.; Seguini, G.; Sparnacci, K.; Antonioli, D.; Gianotti, V.; Laus, M.; Perego, M. Rapid Thermal Processing of Self-Assembling Block Copolymer Thin Films Nanotechnology 2013, 24, 315601
31. Mansky, P.; Russell, T. P.; Hawker, C. J.; Mays, J.; Cook, D. C.; Satija, S. K. Interfacial Segregation in Disordered Block Copolymers: Effect of Tunable Surface Potentials Phys. Rev. Lett. 1997, 79, 237-240
32. Welander, A. M.; Kang, H.; Stuen, K. O.; Solak, H. H.; Müller, M.; de Pablo, J. J.; Nealey, P. F. Rapid Directed Assembly of Block Copolymer Films at Elevated Temperatures Macromolecules 2008, 41, 2759-2761
33. Perego, M.; Ferrarese Lupi, F.; Ceresoli, M.; Giammaria, T. J.; Seguini, G.; Enrico, E.; Boarino, L.; Antonioli, D.; Gianotti, V.; Sparnacci, K.; Laus, M. Ordering Dynamics in Symmetric PS-b-PMMA Diblock Copolymer Thin Films During Rapid Thermal Processing J. Mater. Chem. C 2014, 2, 6655-6664
34. Ceresoli, M.; Ferrarese Lupi, F.; Seguini, G.; Sparnacci, K.; Gianotti, V.; Antonioli, D.; Laus, M.; Boarino, L.; Perego, M. Evolution of Lateral Ordering in Symmetric Block Copolymer Thin Films upon Rapid Thermal Processing Nanotechnology 2014, 25, 275601
35. Gianotti, V.; Antonioli, D.; Sparnacci, K.; Laus, M.; Giammaria, T. J.; Ferrarese Lupi, F.; Seguini, G.; Perego, M. On the Thermal Stability of PS-b-PMMA Block and PS-r-PMMA Random Copolymers for Nanopatterning Applications Macromolecules 2013, 46, 8224-8234
36. Borah, D.; Rasappa, S.; Senthamaraikannan, R.; Shaw, M. T.; Holmes, J. D.; Morris, M. The Sensitivity of Random Polymer Brush-Lamellar Polystyrene-b-Polymethylmethacrylate Block Copolymer Systems to Process Conditions J. Colloid Interface Sci. 2013, 393, 192-202
37. Emerging Research Materials; International Technology Roadmap for Semiconductors (ITRS), 2007.
38. Koo, K.; Ahn, H.; Kim, S.-W.; Ryu, D. Y.; Russell, T. P. Directed Self-Assembly of Block Copolymers in the Extreme: Guiding Microdomains from the Small to the Large Soft Matter 2013, 9, 9059-9071
39. Jakubowski, W.; Min, K.; Matyjaszewski, K. Activators Regenerated by Electron Transfer for Atom Transfer Radical Polymerization of Styrene Macromolecules 2006, 39, 39-45
40. Granel, C.; Dubois, P.; Jérome, R.; Teyssié, P. Controlled Radical Polymerization of Methacrylic Monomers in the Presence of a Bis (ortho-chelated) Arylnickel (II) Complex and Different Activated Alkyl Halides Macromolecules 1996, 29, 8576-8582
41. 2 as Catalyst Macromolecules 1999, 32, 27-35
42. Colombani, D.; Steenbock, M.; Klapper, M.; Mullen, K. 1,3,5,5-Tetraphenyl-D3-1,2,4-triazolin-2-yl Radical-Properties in the Controlled Radical Polymerization of Poly(methyl methacrylate) and Polystyrene Macromol. Rapid Commun. 1997, 18, 243-251
43. Lehrle, R.; Shortland, A. Reproducibility of Filament Pyrolysers: Influence of Sample Deposition and Other Factors Eur. Polym. J. 1993, 29, 1277-1282
44. Lehrle, R.; Atkinson, D. J.; Bate, D.; Gardner, P.; Grimbley, M.; Groves, S.; Place, E.; Williams, R. Diagnosis Mechanisms of Oligomers Formation in the Thermal Degradation of Polymers Polym. Degrad. Stab. 1996, 52, 183-196
45. Manring, L. E. Thermal Degradation of Poly(methyl methacrylate)2. Vinyl-Terminated Polymer Macromolecules 1989, 22, 2673-2677
46. Gianotti, V.; Antonioli, D.; Sparnacci, K.; Laus, M.; Giammaria, T. J.; Ceresoli, M.; Ferrarese Lupi, F.; Seguini, G.; Perego, M. Characterization of Ultra-Thin Polymeric Films by Gas Chromatography-Mass Spectrometry Hyphenated to Thermogravimetry J. Chromatogr., A 2014, 1368, 204-210
47. Russell, T. P.; Hjelm, R. P.; Seeger, P. A. Temperature Dependence of the Interaction Parameter of Polystyrene and Poly (methy1 methacrylate) Macromolecules 1990, 23, 890-893