Fabrication and characterization of NiO thin films prepared by SILAR method

Journal of Alloys and Compounds

Volumn 625, Issue , 2015, Pages 144-148

  Akaltun, Yunus ^a   Çayir, Tuba ^a  

^a ERZINCAN UNIVERSITY   (Turkey)

Author keywords

Film thickness; NiO; Optical properties; Refractive index; SILAR method

Indexed keywords

ENERGY GAP; FILM THICKNESS; GLASS; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

FABRICATION AND CHARACTERIZATIONS; HIGH-FREQUENCY DIELECTRICS; NIO; OPTICAL AND ELECTRICAL PROPERTIES; POLYCRYSTALLINE STRUCTURE; ROOM TEMPERATURE; SILAR METHOD; SUCCESSIVE IONIC LAYER ADSORPTION AND REACTIONS;

REFRACTIVE INDEX;

EID: 84916888923     PISSN: 09258388     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jallcom.2014.10.194     Document Type: Article

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