Structural, electrical and mechanical properties of NiO thin films grown by pulsed laser deposition

Applied Surface Science

Volumn 257, Issue 2, 2010, Pages 429-433

  Fasaki, I ^a,b   Koutoulaki, A ^a,b   Kompitsas, M ^b   Charitidis, C ^b  

^a THEORETICAL AND PHYSICAL CHEMISTRY INSTITUTE   (Greece)

^b NATIONAL TECHNICAL UNIVERSITY OF ATHENS   (Greece)

Author keywords

Electrical; Mechanical properties; Nickel oxide; PLD; Structural; Thin film deposition

Indexed keywords

CRYSTALLINE MATERIALS; MECHANICAL PROPERTIES; NICKEL OXIDE; OXIDE FILMS; PULSED LASER DEPOSITION; PULSED LASERS; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS;

ELECTRICAL; ELECTRICAL AND MECHANICAL PROPERTIES; NANOINDENTATION TESTING; NANOMECHANICAL PROPERTY; REACTIVE PULSED LASER DEPOSITION; RESISTIVITY MEASUREMENT; STRUCTURAL; THIN-FILM DEPOSITIONS;

STRUCTURAL PROPERTIES;

EID: 78049530087     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.07.006     Document Type: Article

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