Effect of heat treatment on the properties of non-stoichiometric p-type nickel oxide films deposited by reactive sputtering

Thin Solid Films

Volumn 488, Issue 1-2, 2005, Pages 242-246

  Yang, Jiin Long ^a   Lai, Yi Sheng ^a   Chen, J S ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Heat treatment; p type NiO; Reactive magnetron sputtering

Indexed keywords

BACKSCATTERING; DIFFERENTIAL SCANNING CALORIMETRY; HEAT TREATMENT; NICKEL COMPOUNDS; NITROGEN; SPUTTERING; STOICHIOMETRY; THERMOGRAVIMETRIC ANALYSIS; ULTRAVIOLET SPECTROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

BACKSCATTERING SPECTROMETRY; NICKEL OXIDE FILMS; P-TYPE NIO; REACTIVE MAGNETRON SPUTTERING;

THIN FILMS;

EID: 23044504453     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.04.061     Document Type: Article

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